Manipulation of ultramicropore sizes of resin‐derived carbon granules for diverse fluoro‐electronic gas purifications

Abstract Ultrapure fluoride electronic gases (e.g., C 3 F 8 and C 2 HF 5 ) constitute indispensable cleaning and etching gases in semiconductor manufacturing. However, the presence of structurally analogous impurities like C 3 F 6 and C 2 ClF 5 poses great purification challenges. Herein, we explored resin‐derived carbon granules (C‐PR‐ x ) with fine‐tuned ultramicroporosity for adsorptive separation of C 3 F 6 /C 3 F 8 , C 2 ClF 5 /C 3 F 8 , and C 2 ClF 5 /C 2 HF 5 gas pairs. C‐PR‐850 (5.4 Å) performs C 3 F 6 /C 3 F 8 molecular sieving behavior with a C 3 F 6 uptake of 0.72 mmol g −1 at 0.1 kPa. C‐PR‐900 (5.6 Å) exhibits high C 2 ClF 5 /C 3 F 8 IAST selectivity of 49.9 at ambient conditions. Furthermore, C‐PR‐950 (5.9 Å) achieves preferential C 2 ClF 5 impurity removal during C 2 HF 5 purification with a high capacity of 0.79 mmol g −1 via differential confinement effects. Breakthrough experiments validate excellent purification performance, yielding >99.9999% (6 N) grade C 3 F 8 and C 2 HF 5 . The scalability, mechanical stability, and moisture resistance of C‐PR‐ x make them attractive as industrial adsorbents. This work provides a viable solution for developing scalable industrial carbon granules for effective electronic gas purification.