Uniform and Robust Field-Free Spin–Orbit Torque Switching via Complementary Double-Wedge Structure
Field-free spin-orbit torque (SOT) switching of perpendicular magnetization is crucial for next-generation magnetic storage chips. However, achieving robust, uniform, and CMOS-compatible field-free SOT switching remains a significant challenge for industrial applications. Here, a robust field-free switching scheme is proposed based on a complementary double-wedge structure with tilted magnetic anisotropy induced by the tilted Pt(111) texture, yielding a remarkable <i>z</i>/<i>y</i> effective field ratio of 89.8%. Uniform performance is obtained across 2 in. wafers for key metrics─anomalous Hall resistance, switching current density, SOT equivalent field, and field-free switching ratio. Notably, the field-free switching is maintained after annealing, confirming its compatibility with CMOS back-end-of-line processes. In addition to ensuring robust field-free switching, the complementary double-wedge design offers superior uniformity compared to the traditional single-wedge structure, making it highly suitable for mass production.
Authors
- Qilin Yang (ORCID: https://orcid.org/0009-0002-7633-1239)
- Xinyu Shu (ORCID: https://orcid.org/0009-0009-6992-8513)
- Tiejun Zhou (ORCID: https://orcid.org/0000-0003-2931-2174)
- Menghao Jin (ORCID: https://orcid.org/0000-0001-6199-780X)
- Haodong Fan (ORCID: https://orcid.org/0000-0001-5703-2351)
- Mingzhang Wei (ORCID: https://orcid.org/0000-0003-3676-921X)
- Zhongshu Feng
- Bo Liu (ORCID: https://orcid.org/0000-0003-0349-9233)
- Ru Bai (ORCID: https://orcid.org/0000-0003-4676-6047)
- Xiaofeng Han
Institutions
- Hangzhou Normal University (CN)
- Signal Processing Devices (Sweden) (SE)
- State Key Laboratory of Chemical Engineering (CN)
- Hangzhou Dianzi University (CN)
Publication Details
- Journal
- Nano Letters
- Published
- 2025-11-12
- DOI
- https://doi.org/10.1021/acs.nanolett.5c04559
- Citations
- 3
- Primary Topic
- Magnetic properties of thin films
- Type
- article
- Field-Weighted Citation Impact
- 3.74