Dynamic Imprint and Recovery Mechanisms in Hf0.2Zr0.8O2 Anti-Ferroelectric Capacitors with FORC Characterization

The conventional static imprint effect in HfxZr1−xO2 (HZO) ferroelectric (FE) devices, which degrades data retention, is generally characterized by a shift in the hysteresis loop along the electric field axis. Unlike the static imprint effect, the dynamic imprint effect emerges under dynamic electric fields or actual operating conditions, making the FE film exceptionally sensitive to switching pulse parameters and domain history. In HZO anti-ferroelectric (AFE) devices, this dynamic imprint effect alters the coercive field distribution associated with domain switching and poses a significant challenge to long-term stable device operation. This study systematically investigates the dynamic imprint effect and its recovery process using a comprehensive integration of first-order reversal curve (FORC) analysis, transient current-voltage (I-V), and polarization-voltage (P-V) characterization. By analyzing localized imprint behavior under sub-cycling conditions, mechanisms and recovery pathways of imprint in AFE devices are proposed. Finally, possible physics-based mechanisms describing imprint behaviors and recovery behaviors are discussed, providing insights for optimizing AFE memory technology performance and reliability.