Effect of Two-Photon Laser Lithography Parameters on the Characteristics of Fabricated Features
We report the results of examining the effect of two-photon laser lithography parameters, such as radiation power, lithography speed, and number of repeated exposures per area, on characteristics of the formed features. Analytical relationships are obtained for each parameter. The degree of oligomer conversion as a function of radiation power is analyzed.
Authors
- С. A. Чесноков (ORCID: https://orcid.org/0000-0002-8671-7269)
- E. R. Zhiganshina (ORCID: https://orcid.org/0000-0002-7003-5183)
- А. В. Писаренко
- Д. А. Колымагин (ORCID: https://orcid.org/0000-0003-3796-8296)
- Å.G. Vitukhnovsky
- D. P. Emelyanov
- A. A. Matskevich
- M. V. Arseniev
Institutions
- P.N. Lebedev Physical Institute of the Russian Academy of Sciences (RU)
- Moscow Institute of Physics and Technology (RU)
- Moscow Power Engineering Institute (RU)
- G.A. Razuvaev Institute of Organometallic Chemistry (RU)
- Moscow Aviation Institute (RU)
Publication Details
- Journal
- Bulletin of the Lebedev Physics Institute
- Published
- 2025-10-01
- DOI
- https://doi.org/10.3103/s1068335625602560
- Primary Topic
- Nonlinear Optical Materials Studies
- Type
- article
- Field-Weighted Citation Impact
- 0.00