Analytical Solution to the Gradual Channel Approximation for Metal–Oxide‐Semiconductor Field‐Effect Transistors

We revisit the problem of the potential distribution in an inversion channel field effect transistor (metal–oxide‐semiconductor field‐effect transistor) within the gradual channel approximation. We present the hitherto not reported analytical solution for the drop of the source‐drain voltage along the channel.

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Publication Details

Journal
physica status solidi (b)
Published
2025-11-22
DOI
https://doi.org/10.1002/pssb.202500555
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
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article

Analytical Solution to the Gradual Channel Approximation for Metal–Oxide‐Semiconductor Field‐Effect Transistors

Marius Grundmann
physica status solidi (b)
Advancements in Semiconductor Devices and Circuit Design
article

Analytical Solution to the Gradual Channel Approximation for Metal–Oxide‐Semiconductor Field‐Effect Transistors

Marius Grundmann
article en

Abstract

We revisit the problem of the potential distribution in an inversion channel field effect transistor (metal–oxide‐semiconductor field‐effect transistor) within the gradual channel approximation. We present the hitherto not reported analytical solution for the drop of the source‐drain voltage along the channel.

physica status solidi (b)
Leipzig University (DE)
Openalex Percentile: Top 64%
Advancements in Semiconductor Devices and Circuit Design
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Analytical Solution to the Gradual Channel Approximation for Metal–Oxide‐Semiconductor Field‐Effect Transistors — Marius Grundmann · physica status solidi (b) (2025) | TGRS Research Map | TGRS