Analytical Solution to the Gradual Channel Approximation for Metal–Oxide‐Semiconductor Field‐Effect Transistors
We revisit the problem of the potential distribution in an inversion channel field effect transistor (metal–oxide‐semiconductor field‐effect transistor) within the gradual channel approximation. We present the hitherto not reported analytical solution for the drop of the source‐drain voltage along the channel.
Authors
- Marius Grundmann (ORCID: https://orcid.org/0000-0001-7554-182X)
Institutions
- Leipzig University (DE)
Publication Details
- Journal
- physica status solidi (b)
- Published
- 2025-11-22
- DOI
- https://doi.org/10.1002/pssb.202500555
- Primary Topic
- Advancements in Semiconductor Devices and Circuit Design
- Type
- article
- Field-Weighted Citation Impact
- 0.00