Probing the Interfacial Mechanism of High‐Performance CuInP <sub>2</sub> S <sub>6</sub> /MoS <sub>2</sub> Visible‐Light Photodetectors
Van der Waals ferroelectrics/semiconductor heterostructures such as CuInP<sub>2</sub>S<sub>6</sub> (CIPS)/ MoS<sub>2</sub> hold promise for optoelectronics, yet their interfacial mechanisms remain poorly understood. Here, it is shown that type-II band alignment at the CIPS/MoS<sub>2</sub> interface not ferroelectric polarization drives high performance. The gate-free devices achieve a photocurrent-to-dark current ratio >10<sup>4</sup>, and a responsivity of 730 A·W<sup>-1</sup> under low-intensity visible illumination without pre-poling. Inserting an h-BN spacer to eliminate direct band alignment sharply degrades device performance, confirming its essential role in enabling efficient photocarrier separation. Nanoscale measurements, photoluminescence quenching, bandgap narrowing, and first-principles calculations all consistently support the presence and function of type-II alignment. These results clarify the operating mechanism of CIPS/MoS<sub>2</sub> devices and offer guidance for interface engineering in 2D optoelectronic devices.
Authors
- Jiawang Hong (ORCID: https://orcid.org/0000-0002-9915-8072)
- Boyuan Huang (ORCID: https://orcid.org/0000-0003-4543-1886)
- Zun‐Yi Deng (ORCID: https://orcid.org/0000-0002-4127-7407)
- Junling Wang (ORCID: https://orcid.org/0000-0003-1611-9674)
- Honghao Li
- Yinxin Bai (ORCID: https://orcid.org/0000-0001-9472-3063)
- Wenjie Ming (ORCID: https://orcid.org/0000-0001-9086-3800)
- Yingli Zhang (ORCID: https://orcid.org/0000-0002-6041-9474)
- Shengyao Su (ORCID: https://orcid.org/0000-0002-5020-7056)
- Changjian Li (ORCID: https://orcid.org/0000-0002-5779-7466)
- Kaizhen Liu (ORCID: https://orcid.org/0000-0002-1364-0061)
- Jin‐Hui Zhong (ORCID: https://orcid.org/0000-0002-2134-3235)
- Xiangping Zhang (ORCID: https://orcid.org/0000-0002-1479-8768)
- Guangtong Yuan
- Guangjie Wu
Institutions
- Beijing Institute of Technology (CN)
- City University of Hong Kong (HK)
- Southern University of Science and Technology (CN)
- Gansu Great Wall Electrical and Electronics Engineering Research Institute (CN)
- Tianshui Normal University (CN)
Publication Details
- Journal
- Small
- Published
- 2025-11-21
- DOI
- https://doi.org/10.1002/smll.202511782
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00