Review of plasma etching processes for III-V semiconductors

Authors

Karin Hinzer (ORCID: https://orcid.org/0000-0002-2414-6288)
A. Clarke (ORCID: https://orcid.org/0000-0001-6786-0951)
Mathieu de Lafontaine (ORCID: https://orcid.org/0000-0001-9158-0693)
Maxime Darnon (ORCID: https://orcid.org/0000-0002-6188-7157)

Publication Details

Journal: Micro and Nano Engineering
Published: 2025-11-13
DOI: https://doi.org/10.1016/j.mne.2025.100330
Primary Topic: Plasma Diagnostics and Applications
Type: article
Field-Weighted Citation Impact: 0.00

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article

Review of plasma etching processes for III-V semiconductors

Karin Hinzer, A. Clarke, Mathieu de Lafontaine, Maxime Darnon

Nov 13, 2025

Micro and Nano Engineering

Plasma Diagnostics and Applications

article

Review of plasma etching processes for III-V semiconductors

Karin Hinzer, A. Clarke, Mathieu de Lafontaine, Maxime Darnon

November 13, 2025article en

Abstract

No abstract available for this paper.

Micro and Nano EngineeringVol. 29

Openalex Percentile: Top 65%

Plasma Diagnostics and Applications

DOI Open Access PDF OpenAlex

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Review of plasma etching processes for III-V semiconductors — Karin Hinzer, A. Clarke, et al. · Micro and Nano Engineering (2025) | TGRS Research Map | TGRS