Novel Approach to Fabricating Ni Replica Stamps via Electroplating for Generating Meta‐Holograms

Abstract Meta‐holograms represent a promising technology that enables efficient imaging by precisely controlling the phase, amplitude, and polarization of light via subwavelength meta‐atoms. Fabricating large‐area meta‐holograms using nanoimprint lithography (NIL) is a subject of intense research, but this approach is limited due to the insufficient durability of the Si master stamp. Herein, a novel approach to address this problem is proposed, which involves developing a robust Ni replica stamp derived from a Si master stamp. Two types of Ni replica stamps are fabricated using electroplating: normal and reverse patterns suitable for use in direct printing and UV NIL, respectively. Scanning electron microscopy of the fabricated Ni replica stamps confirms that they comprise meta‐atoms, with dimensions almost identical to those of the Si master stamp, and they display durability and precision by withstanding multiple NIL processes without significant damage. This scalable, cost‐effective approach presents an effective pathway for producing high‐performance meta‐holograms, addressing the inherent durability problems of Si master stamps in NIL and paving the way for integration into practical nanophotonic applications.