Observation of pn junction in GaAs using defocus CBED pattern

Abstract Nanoscale analysis of pn-junctions in crucial semiconductors like GaAs is vital but challenging, especially for strained hetero-structures where methods like holography and differential phase contrast-scanning transmission electron microscopy face limitations. This study demonstrates the application of defocus convergent-beam electron diffraction (CBED) using conventional TEM to observe GaAs pn-junctions. Distinct dark-and-white line contrasts, independent of defocus sign and attributed to electron deflection by a built-in potential, were observed and confirmed by simulations. While lattice-distortion-sensitive higher-order Laue zone (HOLZ) lines showed neither splitting nor bending in this homojunction, the results highlight defocus CBED’s potential for future simultaneous analysis of potential (via line contrast) and distortion (via HOLZ lines) in complex semiconductor interfaces.

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Publication Details

Journal
Journal of Physics Materials
Published
2025-11-20
DOI
https://doi.org/10.1088/2515-7639/ae220f
Primary Topic
Advanced Electron Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
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article

Observation of pn junction in GaAs using defocus CBED pattern

Daisuke Morikawa, Hirokazu Sasaki, Kenji Tsuda, Makoto Saito
Journal of Physics Materials
Advanced Electron Microscopy Techniques and Applications
article

Observation of pn junction in GaAs using defocus CBED pattern

Daisuke Morikawa, Hirokazu Sasaki, Kenji Tsuda, Makoto Saito
article en

Abstract

Abstract Nanoscale analysis of pn-junctions in crucial semiconductors like GaAs is vital but challenging, especially for strained hetero-structures where methods like holography and differential phase contrast-scanning transmission electron microscopy face limitations. This study demonstrates the application of defocus convergent-beam electron diffraction (CBED) using conventional TEM to observe GaAs pn-junctions. Distinct dark-and-white line contrasts, independent of defocus sign and attributed to electron deflection by a built-in potential, were observed and confirmed by simulations. While lattice-distortion-sensitive higher-order Laue zone (HOLZ) lines showed neither splitting nor bending in this homojunction, the results highlight defocus CBED’s potential for future simultaneous analysis of potential (via line contrast) and distortion (via HOLZ lines) in complex semiconductor interfaces.

Journal of Physics MaterialsVol. 9(1)
Tohoku University (JP), Furukawa Electric (Japan) (JP)
Openalex Percentile: Top 83%
Advanced Electron Microscopy Techniques and Applications
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