Unraveling In‐Plane Crystallographic Anisotropy‐Dependent Memory Performance In Van Der Waals α‐In <sub>2</sub> Se <sub>3</sub> Ferroelectric Semiconductor Field‐Effect Transistors

The ferroelectric semiconductor field-effect transistors (FeS-FETs) based on α-In<sub>2</sub>Se<sub>3</sub> emerge as promising non-volatile memory devices. However, the intrinsic in-plane (IP) crystallographic anisotropy of α-In<sub>2</sub>Se<sub>3</sub> introduces orientation dependence, leading to pronounced variations in memory performance depending on the IP alignment of the source/drain (S/D) contacts. This study presents the first demonstration of IP anisotropy-dependent ferroelectricity in α-In<sub>2</sub>Se<sub>3</sub> FeS-FETs with S/D contacts aligned along the armchair (AC) and zigzag (ZZ) directions. The AC-aligned S/D configuration achieves a ferroelectric resistance switching (FRS) ratio of 6.42, an on/off current ratio of 4.53 × 10<sup>4</sup>, and a normalized memory window (MW) of 59 %, whereas the ZZ-aligned counterpart exhibits an FRS ratio of 1.05, an on/off ratio of 5.25, and negligible MW. The electron transports proceed through twisted pathways along the AC direction, but proceed along a straight trajectory in the ZZ direction to avoid high-energy barrier regions due to the threefold rotational symmetric lattice. Thus, the excessive electron transmission and a reduced Schottky barrier height effectively screen the influence of ferroelectric bound charges in the ZZ-aligned S/D contacts. These findings establish clear correlations between IP anisotropy and the ferroelectric functionality of α-In<sub>2</sub>Se<sub>3</sub>, offering critical guidelines for the design of FeS-FETs.

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Publication Details

Journal
Advanced Materials
Published
2025-11-20
DOI
https://doi.org/10.1002/adma.202517849
Citations
1
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.52
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Unraveling In‐Plane Crystallographic Anisotropy‐Dependent Memory Performance In Van Der Waals α‐In 2 Se 3 Ferroelectric Semiconductor Field‐Effect Transistors

Hyun‐Yong Yu, J.M. Kim, Deji Akinwande, Hongxiao Jin et al.
1 citations
Advanced Materials
2D Materials and Applications
0.52
article

Unraveling In‐Plane Crystallographic Anisotropy‐Dependent Memory Performance In Van Der Waals α‐In 2 Se 3 Ferroelectric Semiconductor Field‐Effect Transistors

Hyun‐Yong Yu, J.M. Kim, Deji Akinwande, Hongxiao Jin, Seung‐Hwan Kim
article en
1 citations

Abstract

The ferroelectric semiconductor field-effect transistors (FeS-FETs) based on α-In<sub>2</sub>Se<sub>3</sub> emerge as promising non-volatile memory devices. However, the intrinsic in-plane (IP) crystallographic anisotropy of α-In<sub>2</sub>Se<sub>3</sub> introduces orientation dependence, leading to pronounced variations in memory performance depending on the IP alignment of the source/drain (S/D) contacts. This study presents the first demonstration of IP anisotropy-dependent ferroelectricity in α-In<sub>2</sub>Se<sub>3</sub> FeS-FETs with S/D contacts aligned along the armchair (AC) and zigzag (ZZ) directions. The AC-aligned S/D configuration achieves a ferroelectric resistance switching (FRS) ratio of 6.42, an on/off current ratio of 4.53 × 10<sup>4</sup>, and a normalized memory window (MW) of 59 %, whereas the ZZ-aligned counterpart exhibits an FRS ratio of 1.05, an on/off ratio of 5.25, and negligible MW. The electron transports proceed through twisted pathways along the AC direction, but proceed along a straight trajectory in the ZZ direction to avoid high-energy barrier regions due to the threefold rotational symmetric lattice. Thus, the excessive electron transmission and a reduced Schottky barrier height effectively screen the influence of ferroelectric bound charges in the ZZ-aligned S/D contacts. These findings establish clear correlations between IP anisotropy and the ferroelectric functionality of α-In<sub>2</sub>Se<sub>3</sub>, offering critical guidelines for the design of FeS-FETs.

Advanced MaterialsVol. 38(7)
Chonnam National University (KR), Gwangju National University of Education (KR), Korea University (KR), Korea University (JP), The University of Texas at Austin (US)
Openalex Percentile: Top 30%
2D Materials and Applications
0.52
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