Unraveling In‐Plane Crystallographic Anisotropy‐Dependent Memory Performance In Van Der Waals α‐In <sub>2</sub> Se <sub>3</sub> Ferroelectric Semiconductor Field‐Effect Transistors
The ferroelectric semiconductor field-effect transistors (FeS-FETs) based on α-In<sub>2</sub>Se<sub>3</sub> emerge as promising non-volatile memory devices. However, the intrinsic in-plane (IP) crystallographic anisotropy of α-In<sub>2</sub>Se<sub>3</sub> introduces orientation dependence, leading to pronounced variations in memory performance depending on the IP alignment of the source/drain (S/D) contacts. This study presents the first demonstration of IP anisotropy-dependent ferroelectricity in α-In<sub>2</sub>Se<sub>3</sub> FeS-FETs with S/D contacts aligned along the armchair (AC) and zigzag (ZZ) directions. The AC-aligned S/D configuration achieves a ferroelectric resistance switching (FRS) ratio of 6.42, an on/off current ratio of 4.53 × 10<sup>4</sup>, and a normalized memory window (MW) of 59 %, whereas the ZZ-aligned counterpart exhibits an FRS ratio of 1.05, an on/off ratio of 5.25, and negligible MW. The electron transports proceed through twisted pathways along the AC direction, but proceed along a straight trajectory in the ZZ direction to avoid high-energy barrier regions due to the threefold rotational symmetric lattice. Thus, the excessive electron transmission and a reduced Schottky barrier height effectively screen the influence of ferroelectric bound charges in the ZZ-aligned S/D contacts. These findings establish clear correlations between IP anisotropy and the ferroelectric functionality of α-In<sub>2</sub>Se<sub>3</sub>, offering critical guidelines for the design of FeS-FETs.
Authors
- Hyun‐Yong Yu (ORCID: https://orcid.org/0000-0001-9446-5981)
- J.M. Kim (ORCID: https://orcid.org/0000-0003-0678-6692)
- Deji Akinwande (ORCID: https://orcid.org/0000-0001-7133-5586)
- Hongxiao Jin (ORCID: https://orcid.org/0000-0001-6546-9529)
- Seung‐Hwan Kim (ORCID: https://orcid.org/0000-0002-5899-2853)
Institutions
- Chonnam National University (KR)
- Gwangju National University of Education (KR)
- Korea University (KR)
- Korea University (JP)
- The University of Texas at Austin (US)
Publication Details
- Journal
- Advanced Materials
- Published
- 2025-11-20
- DOI
- https://doi.org/10.1002/adma.202517849
- Citations
- 1
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.52