Regrowth-Free GaN RF HEMTs Achieving <i>f</i> <sub>max</sub> of 403 GHz via Periodic Contact Structures
A regrowth-free sub-THz HEMT is demonstrated using a periodic contact scheme that transforms conventional linear contacts into a configuration with far better overall contact resistance (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</sub>). This method yielded a consistent low <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">R</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C</sub> down to 0.15 Ωmm. Furthermore, this technique is based on a Au-free low-temperature annealing metalization (Ti/Al), which results in extremely smooth edges, allowing for sub 500 nm channel scaling. These features enabled – for the first time – the demonstration of regrowth-free GaN RF HEMT with <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">f</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub>/<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">f</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> of 176/403 GHz. These results are comparable to the best GaN HEMTs with similar geometry, highlighting the enormous potential of periodic contact structures for high performance RF and sub-THz devices.
Authors
- Hongkeng Zhu (ORCID: https://orcid.org/0000-0001-8977-0199)
- Amirhossein Esteghamat (ORCID: https://orcid.org/0009-0006-4074-9122)
- Elison Matioli (ORCID: https://orcid.org/0000-0001-6475-001X)
- M. A. Rezaei (ORCID: https://orcid.org/0000-0002-7542-8680)
Institutions
- École Polytechnique Fédérale de Lausanne (CH)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-11-14
- DOI
- https://doi.org/10.1109/led.2025.3633055
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00