Logistic Modeling of Copper Oxidation in Alkaline Media Considering Solubility Gaps between the Solid Oxidation Products

A theoretical model is proposed to describe the essential features appearing in the voltammetry of copper electrodes in contact with aqueous alkaline media. The model is based on the introduction of miscibility gaps into a logistic formulation of the charge/potential relationship. This is directly inspired by ion-insertion electrochemistry and emphasizes the OH–-assisted nature of the involved oxidation processes. The model accounts for miscibility limits and refinements, accounting for deviations from reversibility, diffusive constraints, and nucleation rate effects can be added. Linear potential scan voltammetric parameters, in particular the large potential hiatus existing between anodic and cathodic peaks, can be satisfactorily reproduced with this model.

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Publication Details

Journal
The Journal of Physical Chemistry C
Published
2025-11-12
DOI
https://doi.org/10.1021/acs.jpcc.5c07223
Citations
1
Primary Topic
Electrodeposition and Electroless Coatings
Type
article
Field-Weighted Citation Impact
0.73
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article

Logistic Modeling of Copper Oxidation in Alkaline Media Considering Solubility Gaps between the Solid Oxidation Products

Ana Martínez-Ibernón, José Vicente Gimeno-Adelantado, Antonio Doménech‐Carbó
1 citations
The Journal of Physical Chemistry C
Electrodeposition and Electroless Coatings
0.73
article

Logistic Modeling of Copper Oxidation in Alkaline Media Considering Solubility Gaps between the Solid Oxidation Products

Ana Martínez-Ibernón, José Vicente Gimeno-Adelantado, Antonio Doménech‐Carbó
article en
1 citations

Abstract

A theoretical model is proposed to describe the essential features appearing in the voltammetry of copper electrodes in contact with aqueous alkaline media. The model is based on the introduction of miscibility gaps into a logistic formulation of the charge/potential relationship. This is directly inspired by ion-insertion electrochemistry and emphasizes the OH–-assisted nature of the involved oxidation processes. The model accounts for miscibility limits and refinements, accounting for deviations from reversibility, diffusive constraints, and nucleation rate effects can be added. Linear potential scan voltammetric parameters, in particular the large potential hiatus existing between anodic and cathodic peaks, can be satisfactorily reproduced with this model.

The Journal of Physical Chemistry CVol. 129(49)
Universitat de València (ES), Institute for Molecular Medicine (US), Universitat Politècnica de València (ES)
Openalex Percentile: Top 22%
Electrodeposition and Electroless Coatings
0.73
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