Enhanced light extraction efficiency via double-mesa structure for 273 nm and 244 nm AlGaN-based deep ultraviolet light-emitting diodes

• A double-mesa-structured AlGaN-based DUV LED is proposed, with a second inclined sidewall by etching n-AlGaN and AlN layers. • The double mesa design introduces extra reflection paths, enhancing the extraction of photons in the n-AlGaN and AlN layers. • For 273 nm AlGaN-based DUV LEDs, the double-mesa structure improves EQE and WPE by 12.69 % and 11.79 %, respectively. • For 244 nm AlGaN-based DUV LEDs, the double-mesa structure improves EQE and WPE by 17.68 % and 12.80 %, respectively. This study proposes a double mesa sidewall reflector structure to optimize the light extraction efficiency (LEE) of AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs). Traditional sidewall reflector designs rely on a single mesa etched down to the n-AlGaN layer. However, a considerable portion of emission from the active region fails to be efficiently reflected, leaving photons remain trapped within the n-AlGaN and AlN layers beneath the mesa. To address this issue, we further etch the n-AlGaN and AlN layers between and outside the interdigitated mesas, creating a second mesa with inclined sidewalls. The sidewall reflection from this second mesa effectively extracts the previously confined light, thereby enhancing the device performance. Here, double mesa AlGaN-based DUV LEDs are fabricated and characterized at two distinct wavelengths of 273 nm and 244 nm. For the 273 nm LED with dominant transverse electric (TE) −polarized emission, enhancements in external quantum efficiency (EQE) and wall-plug efficiency (WPE) of approximately 12.69 % and 11.79 % are achieved, respectively. Meanwhile, the 244 nm LED with dominant transverse magnetic (TM) −polarized emission exhibits even greater EQE and WPE improvements of 17.68 % and 12.80 %, respectively. The proposed double mesa sidewall architecture offers a practical and effective way for optimizing sidewall reflectors — particularly when implemented with interdigitated electrodes — and provides valuable insight into enhancing the LEE of AlGaN-based DUV LEDs.

Authors

Institutions

Publication Details

Journal
Optics & Laser Technology
Published
2025-11-13
DOI
https://doi.org/10.1016/j.optlastec.2025.114229
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Enhanced light extraction efficiency via double-mesa structure for 273 nm and 244 nm AlGaN-based deep ultraviolet light-emitting diodes

Zhiming Shi, Kexi Liu, Xianjun Wang, Xiaojuan Sun et al.
Optics & Laser Technology
GaN-based semiconductor devices and materials
article

Enhanced light extraction efficiency via double-mesa structure for 273 nm and 244 nm AlGaN-based deep ultraviolet light-emitting diodes

Zhiming Shi, Kexi Liu, Xianjun Wang, Xiaojuan Sun, Yang Chen, Yuping Jia, Mingrui Liu, Ke Jiang, Bingxiang Wang, Shunpeng Lv, Dabing Li, Shanli Zhang
article en

Abstract

• A double-mesa-structured AlGaN-based DUV LED is proposed, with a second inclined sidewall by etching n-AlGaN and AlN layers. • The double mesa design introduces extra reflection paths, enhancing the extraction of photons in the n-AlGaN and AlN layers. • For 273 nm AlGaN-based DUV LEDs, the double-mesa structure improves EQE and WPE by 12.69 % and 11.79 %, respectively. • For 244 nm AlGaN-based DUV LEDs, the double-mesa structure improves EQE and WPE by 17.68 % and 12.80 %, respectively. This study proposes a double mesa sidewall reflector structure to optimize the light extraction efficiency (LEE) of AlGaN-based deep ultraviolet (DUV) light-emitting diodes (LEDs). Traditional sidewall reflector designs rely on a single mesa etched down to the n-AlGaN layer. However, a considerable portion of emission from the active region fails to be efficiently reflected, leaving photons remain trapped within the n-AlGaN and AlN layers beneath the mesa. To address this issue, we further etch the n-AlGaN and AlN layers between and outside the interdigitated mesas, creating a second mesa with inclined sidewalls. The sidewall reflection from this second mesa effectively extracts the previously confined light, thereby enhancing the device performance. Here, double mesa AlGaN-based DUV LEDs are fabricated and characterized at two distinct wavelengths of 273 nm and 244 nm. For the 273 nm LED with dominant transverse electric (TE) −polarized emission, enhancements in external quantum efficiency (EQE) and wall-plug efficiency (WPE) of approximately 12.69 % and 11.79 % are achieved, respectively. Meanwhile, the 244 nm LED with dominant transverse magnetic (TM) −polarized emission exhibits even greater EQE and WPE improvements of 17.68 % and 12.80 %, respectively. The proposed double mesa sidewall architecture offers a practical and effective way for optimizing sidewall reflectors — particularly when implemented with interdigitated electrodes — and provides valuable insight into enhancing the LEE of AlGaN-based DUV LEDs.

Optics & Laser TechnologyVol. 193
Changchun Institute of Optics, Fine Mechanics and Physics (CN), University of Chinese Academy of Sciences (CN)
Openalex Percentile: Top 78%
GaN-based semiconductor devices and materials
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.