Recent advances in computational lithography technology

Abstract As semiconductor manufacturing technology advances, lithography faces increasingly severe challenges from resolution limitations and process variability. Computational lithography has become a critical technology that ensures manufacturability and yield in advanced semiconductor nodes. This paper comprehensively reviews recent advancements in computational lithography, focusing on three core areas: lithography modeling, hotspot detection, and mask optimization. Particular attention is given to innovative applications of machine learning in these domains, along with an analysis of the technical challenges in full-chip optimization. By summarizing the latest technologies and applications, this paper aims to offer valuable insights into the trends and future directions of computational lithography in advanced semiconductor manufacturing.