CUDO: closed-form universal dwell-time optimization for computer-controlled optical surfacing
Precision optical figuring demands fast and accurate dwell time optimization to reach nanometer- and sub-nanometer-level accuracy in next-generation optical systems. We introduce CUDO (closed-form universal dwell-time optimization), the first, to the best of our knowledge, unified closed-form analytical framework that supports both function-form and matrix-form dwell time models in computer-controlled optical surfacing (CCOS). In contrast to traditional methods, which rely on iterative optimization and hyperparameter tuning, our framework derives direct analytical solutions with no adjustable parameters. This approach unifies the solution principles of existing methods within a single mathematical model, delivering three key advantages: (1) accuracy on par with, or superior to, iterative solvers, (2) substantial reduction in computation time, and (3) numerical robustness. Comparative studies with prior art confirm that closed-form solutions achieve equivalent residual error while removing runtime bottlenecks. By simplifying the implementation and enabling real-time, scalable deployment, CUDO establishes a practical foundation for future deterministic fabrication of large-aperture and high-performance optics.
Authors
- Corey Austin (ORCID: https://orcid.org/0000-0001-5488-9480)
- Lei Huang (ORCID: https://orcid.org/0000-0002-5645-5173)
- Heejoo Choi
- Mourad Idir (ORCID: https://orcid.org/0000-0003-3301-7274)
- Xiaolong Ke
- Hyukmo Kang (ORCID: https://orcid.org/0000-0002-2224-1353)
- Vipender Singh Negi (ORCID: https://orcid.org/0000-0003-3688-9270)
- Yiming Zhang (ORCID: https://orcid.org/0000-0002-7922-348X)
- Tianyi Wang (ORCID: https://orcid.org/0000-0002-0453-5331)
- Yingnan Ma
- Dae Wook Kim (ORCID: https://orcid.org/0009-0000-3871-8913)
- Ryan Luu
Institutions
- University of Arizona (US)
- Hainan Agricultural School (CN)
- Xiamen University of Technology (CN)
Publication Details
- Journal
- Optics Express
- Published
- 2025-11-13
- DOI
- https://doi.org/10.1364/oe.577940
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00