Intrinsic defect intolerance in the ultra-pure metal PtSn4

Ultra-pure materials are highly valued as model systems for the study of intrinsic physics. Frequently, however, the crystal growth of such pristine samples requires significant optimization. PtSn<sub>4</sub> is a rare example of a material that naturally forms with a very low concentration of crystalline defects. Here, we investigate the origin of its low defect levels using a combination of electrical resistivity measurements, computational modeling, and scanning tunneling microscopy imaging. While typical flux-grown crystals of PtSn<sub>4</sub> can have residual resistivity ratios (RRRs) that exceed 1000, we show that even at the most extreme formation speeds, the RRR cannot be suppressed below 100. This aversion to defect formation extends to both the Pt and Sn sublattices, which contribute with equal weight to the conduction properties. Direct local imaging with scanning tunneling microscopy further substantiates the rarity of point defects, while the prohibitive energetic cost of forming a defect is demonstrated through density functional theory calculations. Taken together, our results establish PtSn<sub>4</sub> as an intrinsically defect-intolerant material, making it an ideal platform to study other properties of interest, including extreme magnetoresistance and topology.

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Publication Details

Journal
Communications Materials
Published
2025-11-11
DOI
https://doi.org/10.1038/s43246-025-00964-3
Primary Topic
Surface and Thin Film Phenomena
Type
article
Field-Weighted Citation Impact
0.00

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article

Intrinsic defect intolerance in the ultra-pure metal PtSn4

Sarah A. Burke, Alberta L. Warner, Ashutosh Kumar Singh, Alannah M. Hallas et al.
Communications Materials
Surface and Thin Film Phenomena
article

Intrinsic defect intolerance in the ultra-pure metal PtSn4

Sarah A. Burke, Alberta L. Warner, Ashutosh Kumar Singh, Alannah M. Hallas, Niclas Heinsdorf, D. A. Bonn, Dong Chen, Samikshya Sahu, Markus Altthaler
article en

Abstract

Ultra-pure materials are highly valued as model systems for the study of intrinsic physics. Frequently, however, the crystal growth of such pristine samples requires significant optimization. PtSn<sub>4</sub> is a rare example of a material that naturally forms with a very low concentration of crystalline defects. Here, we investigate the origin of its low defect levels using a combination of electrical resistivity measurements, computational modeling, and scanning tunneling microscopy imaging. While typical flux-grown crystals of PtSn<sub>4</sub> can have residual resistivity ratios (RRRs) that exceed 1000, we show that even at the most extreme formation speeds, the RRR cannot be suppressed below 100. This aversion to defect formation extends to both the Pt and Sn sublattices, which contribute with equal weight to the conduction properties. Direct local imaging with scanning tunneling microscopy further substantiates the rarity of point defects, while the prohibitive energetic cost of forming a defect is demonstrated through density functional theory calculations. Taken together, our results establish PtSn<sub>4</sub> as an intrinsically defect-intolerant material, making it an ideal platform to study other properties of interest, including extreme magnetoresistance and topology.

Communications MaterialsVol. 6(1)
Canadian Institute for Advanced Research (CA), University of British Columbia (CA), Max Planck Institute for Solid State Research (DE)
Canadian Institute for Advanced Research, Deutsche Forschungsgemeinschaft, University of Tokyo, Canada First Research Excellence Fund, Natural Sciences and Engineering Research Council of Canada
Openalex Percentile: Top 73%
Surface and Thin Film Phenomena
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