Stitching Interferometry for X-Ray Mirror Metrology at the Hefei Advanced Light Facility (HALF)

The advancements in the 4th-generation synchrotron radiation light sources, characterized by their enhanced coherence and brightness, have led to more stringent requirements for the surface quality of X-ray mirrors used in beamlines. This poses a significant challenge to the metrology of X-ray mirrors. This research work focuses on high-precision measurement techniques for X-ray mirrors. The algorithmic principles of various stitching methods were introduced in detail, and a custom-built stitching measurement system was demonstrated. The system was used to perform a stitching measurement on an elliptical X-ray mirror, and the results showed high consistency with the data provided by JTEC. This verifies the effectiveness of the stitching interferometry method and the high measurement capability of our system.