[(Ph <sub>3</sub> P)Ag(OCF <sub>2</sub> CF <sub>2</sub> SO <sub>2</sub> F)] <sub>2</sub> : A Thermally Stable Reagent for Fluorosulfonyl Tetrafluoroethoxylation

A thermally stable, light-insensitive crystalline fluorosulfonyl tetrafluoroethoxylating reagent, [(Ph<sub>3</sub>P)Ag(OCF<sub>2</sub>CF<sub>2</sub>SO<sub>2</sub>F)]<sub>2</sub> (<b>1</b>), was developed. The reagent demonstrates high nucleophilicity toward diverse electrophiles, including benzyl bromides/chlorides, alkyl bromides, triflates, and secondary alkyl nosylates. The incorporated sulfonyl fluoride moiety demonstrates remarkable versatility, undergoing facile conversion to both sulfonates and sulfones through reactions with various nucleophiles. Furthermore, we have successfully applied this chemistry to prepare a series of photoacid generators with potential applications in photolithography technology.

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Publication Details

Journal
The Journal of Organic Chemistry
Published
2025-11-06
DOI
https://doi.org/10.1021/acs.joc.5c01771
Primary Topic
Fluorine in Organic Chemistry
Type
article
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article

[(Ph 3 P)Ag(OCF 2 CF 2 SO 2 F)] 2 : A Thermally Stable Reagent for Fluorosulfonyl Tetrafluoroethoxylation

Shunli Chen, Qilong Shen, Long Lü
The Journal of Organic Chemistry
Fluorine in Organic Chemistry
article

[(Ph 3 P)Ag(OCF 2 CF 2 SO 2 F)] 2 : A Thermally Stable Reagent for Fluorosulfonyl Tetrafluoroethoxylation

Shunli Chen, Qilong Shen, Long Lü
article en

Abstract

A thermally stable, light-insensitive crystalline fluorosulfonyl tetrafluoroethoxylating reagent, [(Ph<sub>3</sub>P)Ag(OCF<sub>2</sub>CF<sub>2</sub>SO<sub>2</sub>F)]<sub>2</sub> (<b>1</b>), was developed. The reagent demonstrates high nucleophilicity toward diverse electrophiles, including benzyl bromides/chlorides, alkyl bromides, triflates, and secondary alkyl nosylates. The incorporated sulfonyl fluoride moiety demonstrates remarkable versatility, undergoing facile conversion to both sulfonates and sulfones through reactions with various nucleophiles. Furthermore, we have successfully applied this chemistry to prepare a series of photoacid generators with potential applications in photolithography technology.

The Journal of Organic ChemistryVol. 90(46)
Shanghai Institute of Organic Chemistry (CN)
Openalex Percentile: Top 74%
Fluorine in Organic Chemistry
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