Global Potential Energy Surface Exploration of In–Ga–Zn–O (IGZO) Reveals Ga-Rich Layered Channel Material

C-axis aligned crystalline indium-gallium-zinc oxides (CAAC-IGZOs) with layered phase are widely utilized as functional tunnel material for thin-film transistors (TFTs). Their performance, i.e., stability or mobility etc., of IGZO strongly depends on the indium:gallium:zinc (In:Ga:Zn) ratio, yet most of reports limit to the simplest 1:1:1 ratio for the great difficulty to explore comprehensively the quaternary IGZO material at all possible contents. Herein by developing a quaternary In-Ga-Zn-O global neural network potential, we searched for the full energy landscape with 137 compositions for IGZO, based on which the thermodynamic stable composition range is revealed to be in a general formula of (In<sub><i>x</i></sub>Ga<sub>2-<i>x</i></sub>ZnO<sub>4</sub>)<sub><i>m</i></sub>(ZnO)<sub><i>n</i></sub> with 0.5 < <i>x</i> < 1.5, <i>m</i> > 1 and <i>n</i> as a non-negative integer. Importantly, 15 stable CAAC-IGZO candidates are screened out with favorable thermal and optical stability. Their electrical properties and device simulation are verified by density functional theory (DFT) calculations. Our results showed that apart from IGZO(1:1:1), a Ga-rich IGZO(3:5:4) phase can also have similar electrical properties (bandgap ∼ 2.8 eV, effective mass ∼ 0.26 <i>m</i><sub>0</sub>) and favorable properties with subthreshold swing being 82 meV/dec in a simulated 6 nm device, respectively, superior to IGZO(1:1:1) 88 meV/dec.

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Journal
The Journal of Physical Chemistry Letters
Published
2025-11-06
DOI
https://doi.org/10.1021/acs.jpclett.5c02819
Primary Topic
Thin-Film Transistor Technologies
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article
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article

Global Potential Energy Surface Exploration of In–Ga–Zn–O (IGZO) Reveals Ga-Rich Layered Channel Material

Zhi‐Pan Liu, Y. Hu, Zhi‐Xin Guo, Yefei Li et al.
The Journal of Physical Chemistry Letters
Thin-Film Transistor Technologies
article

Global Potential Energy Surface Exploration of In–Ga–Zn–O (IGZO) Reveals Ga-Rich Layered Channel Material

Zhi‐Pan Liu, Y. Hu, Zhi‐Xin Guo, Yefei Li, Jili Li
article en

Abstract

C-axis aligned crystalline indium-gallium-zinc oxides (CAAC-IGZOs) with layered phase are widely utilized as functional tunnel material for thin-film transistors (TFTs). Their performance, i.e., stability or mobility etc., of IGZO strongly depends on the indium:gallium:zinc (In:Ga:Zn) ratio, yet most of reports limit to the simplest 1:1:1 ratio for the great difficulty to explore comprehensively the quaternary IGZO material at all possible contents. Herein by developing a quaternary In-Ga-Zn-O global neural network potential, we searched for the full energy landscape with 137 compositions for IGZO, based on which the thermodynamic stable composition range is revealed to be in a general formula of (In<sub><i>x</i></sub>Ga<sub>2-<i>x</i></sub>ZnO<sub>4</sub>)<sub><i>m</i></sub>(ZnO)<sub><i>n</i></sub> with 0.5 < <i>x</i> < 1.5, <i>m</i> > 1 and <i>n</i> as a non-negative integer. Importantly, 15 stable CAAC-IGZO candidates are screened out with favorable thermal and optical stability. Their electrical properties and device simulation are verified by density functional theory (DFT) calculations. Our results showed that apart from IGZO(1:1:1), a Ga-rich IGZO(3:5:4) phase can also have similar electrical properties (bandgap ∼ 2.8 eV, effective mass ∼ 0.26 <i>m</i><sub>0</sub>) and favorable properties with subthreshold swing being 82 meV/dec in a simulated 6 nm device, respectively, superior to IGZO(1:1:1) 88 meV/dec.

The Journal of Physical Chemistry LettersVol. 16(45)
Fudan University (CN), Division of Materials Science and Engineering (AU), Collaborative Innovation Center of Chemistry for Energy Materials (CN), Xi'an Jiaotong University (CN)
Openalex Percentile: Top 67%
Thin-Film Transistor Technologies
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Global Potential Energy Surface Exploration of In–Ga–Zn–O (IGZO) Reveals Ga-Rich Layered Channel Material — Zhi‐Pan Liu, Y. Hu, et al. · The Journal of Physical Chemistry Letters (2025) | TGRS Research Map | TGRS