Enabling Energy-Efficient and High-Density eDRAM-LUT-Based Computing-in-Memory Using Anti-Ferroelectric Transistors

This paper reports a novel energy-efficient and high-memory/compute-density eDRAM Computing-in-Memory (CiM) by introducing AFEFET-based eDRAM cells into look-up tables (LUTs). The highlights include: (1) Fabricated 1-transistor-1AFEFET (1T1AF) eDRAM cell with short Amorphous-Indium-Gallium-Zinc-Oxide (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$a$</tex>-IGZO) channel length of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{2 5 ~ n m}$</tex> and high cell density; (2) Measured high endurance over <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$2 \times 10^{9}$</tex> cycles for AFEFETs and long retention time over <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$10^{3} \mathrm{s}$</tex> for 1T1AF eDRAM cell; (3) Proposed computation mode combining digital LUT and analog capacitor coupling for the first time, enabling high energy efficiency, high compute density, and high accuracy. Evaluation results show that the proposed 1T1AF eDRAM-LUT-based CiM achieves a high memory density of 5.52 Mb/mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, a high 8 b peak compute density of 11.3 TOPS/mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, and a high 8 b peak energy efficiency of 107.2 TOPS/W, showing great potential for energy-efficient and high-performance CiM designs.

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Published
2025-09-08
DOI
https://doi.org/10.1109/esserc66193.2025.11214025
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
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article

Enabling Energy-Efficient and High-Density eDRAM-LUT-Based Computing-in-Memory Using Anti-Ferroelectric Transistors

Zijie Zheng, Leming Jiao, Xiaoyang Ma, Xiao Gong et al.
Ferroelectric and Negative Capacitance Devices
article

Enabling Energy-Efficient and High-Density eDRAM-LUT-Based Computing-in-Memory Using Anti-Ferroelectric Transistors

Zijie Zheng, Leming Jiao, Xiaoyang Ma, Xiao Gong, Chen Jiang, Hongtao Zhong, Thomas Kämpfe, Zuopu Zhou, Hongyang Jia, Xueqing Li, Zhonghao Chen, Taixin Li, Huazhong Yang, Kai Ni
article en

Abstract

This paper reports a novel energy-efficient and high-memory/compute-density eDRAM Computing-in-Memory (CiM) by introducing AFEFET-based eDRAM cells into look-up tables (LUTs). The highlights include: (1) Fabricated 1-transistor-1AFEFET (1T1AF) eDRAM cell with short Amorphous-Indium-Gallium-Zinc-Oxide (<tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$a$</tex>-IGZO) channel length of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{2 5 ~ n m}$</tex> and high cell density; (2) Measured high endurance over <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$2 \times 10^{9}$</tex> cycles for AFEFETs and long retention time over <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$10^{3} \mathrm{s}$</tex> for 1T1AF eDRAM cell; (3) Proposed computation mode combining digital LUT and analog capacitor coupling for the first time, enabling high energy efficiency, high compute density, and high accuracy. Evaluation results show that the proposed 1T1AF eDRAM-LUT-based CiM achieves a high memory density of 5.52 Mb/mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, a high 8 b peak compute density of 11.3 TOPS/mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>, and a high 8 b peak energy efficiency of 107.2 TOPS/W, showing great potential for energy-efficient and high-performance CiM designs.

University of Notre Dame (US), National University of Singapore (SG), Princeton University (US), Fraunhofer Institute for Photonic Microsystems (DE), Tsinghua University (CN)
Openalex Percentile: Top 68%
Ferroelectric and Negative Capacitance Devices
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