Effect of hydrogen peroxide treatment on the photosensitive properties of oriented ZnO nanostructures

In this study, the effect of post depositional treatment with 30 % hydrogen peroxide (H 2 O 2 ) solution on the structural and photosensitive properties of ZnO nanostructures were explored. No significant changes were observed in the morphology and structure of ZnO post H 2 O 2 treatment, however, there were observable changes in the intrinsic defect states. Post treatment, position and intensity of the ultraviolet emission in the photoluminescence spectra was unaltered while visible emissions were suppressed, indicating passivation of these defect states (which were mostly oxygen vacancy related) by H 2 O 2 . Due to passivation of these defects, highly resistive layer was formed on ZnO surface due to which photoconductivity and dark current were subdued. Some of the photosensitive metrics such as sensitivity, recovery time showed good improvement post treatment while responsivity and detectivity suffered slightly. • Oriented ZnO nanostructures deposited on glass substrate by APCVD. • Room temperature PL,SEM-EDS, XRD,FTIR performed before & after H 2 O 2 treatment. • IV measurements as a function of UV radiation wavelength were performed. • Effect of H 2 O 2 on photoconductivity, sensitivity & recovery time calculated. • Responsivity shows slight reduction post H 2 O 2 treatment.