Investigation of electrical transport mechanisms in an n-CdIn <sub>2</sub> Se <sub>4</sub> /Pt thin film Schottky diode fabricated by pulsed laser deposition

This investigation focuses on the fabrication of an n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode using the pulsed laser deposition technique. The typical grazing incidence X-ray diffractogram displays a sharp and bright 〈1 1 1〉 characteristic reflection, confirming the formation of polycrystalline CdIn<sub>2</sub>Se<sub>4</sub> thin films. Various microstructural parameters have been calculated for the CdIn<sub>2</sub>Se<sub>4</sub> thin films using the most prominent 〈1 1 1〉 reflection. Hall measurement examination confirmed the n-type conductivity of the CdIn<sub>2</sub>Se<sub>4</sub> thin films. Characterization of the voltage-current curve of the vacuum-fabricated n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode confirms the presence of a typical Schottky diode-type junction between CdIn<sub>2</sub>Se<sub>4</sub> and platinum with a good rectification ratio. The principal conducting mechanism of the produced n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode is thermionic emission at lower applied biases (≤0.5 V), while the space charge limited conduction mechanism is dominant at higher biases (>0.5 V). The ideality factor values for the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode are in the range of 1.4819 to 1.8102, depending on the temperature (300 K ≤ <i>T</i> ≤ 342 K). The zero-bias barrier height and effective Richardson's constant of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode are ≃0.8652 eV and ≃1.8771 × 10<sup>5</sup> A m<sup>-2</sup> K<sup>2</sup>, respectively. The effective density of permitted energy levels is ≃1.5491 × 10<sup>24</sup> m<sup>-3</sup> in the conduction band of the n-CdIn<sub>2</sub>Se<sub>4</sub> thin films. Additionally, characterization of the voltage-capacitance curve of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode revealed its zero bias built-in diffusion potential (≃0.8178 V), donor impurity concentration (≃5.9132 × 10<sup>21</sup> m<sup>-3</sup>), and flat-band barrier height (≃0.9525 eV). Based on Anderson's model, several electrical transport parameters were applied to depict the theoretical energy band diagram of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode. The functional groups present in the CdIn<sub>2</sub>Se<sub>4</sub> thin films deposited on a platinum thin film substrate were determined using Fourier transform infrared spectroscopy.

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Journal
RSC Advances
Published
2025-01-01
DOI
https://doi.org/10.1039/d5ra05715a
Primary Topic
Semiconductor materials and interfaces
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article

Investigation of electrical transport mechanisms in an n-CdIn 2 Se 4 /Pt thin film Schottky diode fabricated by pulsed laser deposition

S. D. Dhruv, А. И. Серокурова, Bharat Kataria, J. H. Markna et al.
RSC Advances
Semiconductor materials and interfaces
article

Investigation of electrical transport mechanisms in an n-CdIn 2 Se 4 /Pt thin film Schottky diode fabricated by pulsed laser deposition

S. D. Dhruv, А. И. Серокурова, Bharat Kataria, J. H. Markna, С. А. Шарко, D. L. Goroshko, D. K. Dhruv, Nikolai N. Novitskii, Tanvi Dudharejiya, Parth Rayani, Jagruti Jangale
article en

Abstract

This investigation focuses on the fabrication of an n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode using the pulsed laser deposition technique. The typical grazing incidence X-ray diffractogram displays a sharp and bright 〈1 1 1〉 characteristic reflection, confirming the formation of polycrystalline CdIn<sub>2</sub>Se<sub>4</sub> thin films. Various microstructural parameters have been calculated for the CdIn<sub>2</sub>Se<sub>4</sub> thin films using the most prominent 〈1 1 1〉 reflection. Hall measurement examination confirmed the n-type conductivity of the CdIn<sub>2</sub>Se<sub>4</sub> thin films. Characterization of the voltage-current curve of the vacuum-fabricated n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode confirms the presence of a typical Schottky diode-type junction between CdIn<sub>2</sub>Se<sub>4</sub> and platinum with a good rectification ratio. The principal conducting mechanism of the produced n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode is thermionic emission at lower applied biases (≤0.5 V), while the space charge limited conduction mechanism is dominant at higher biases (>0.5 V). The ideality factor values for the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode are in the range of 1.4819 to 1.8102, depending on the temperature (300 K ≤ <i>T</i> ≤ 342 K). The zero-bias barrier height and effective Richardson's constant of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode are ≃0.8652 eV and ≃1.8771 × 10<sup>5</sup> A m<sup>-2</sup> K<sup>2</sup>, respectively. The effective density of permitted energy levels is ≃1.5491 × 10<sup>24</sup> m<sup>-3</sup> in the conduction band of the n-CdIn<sub>2</sub>Se<sub>4</sub> thin films. Additionally, characterization of the voltage-capacitance curve of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode revealed its zero bias built-in diffusion potential (≃0.8178 V), donor impurity concentration (≃5.9132 × 10<sup>21</sup> m<sup>-3</sup>), and flat-band barrier height (≃0.9525 eV). Based on Anderson's model, several electrical transport parameters were applied to depict the theoretical energy band diagram of the n-CdIn<sub>2</sub>Se<sub>4</sub>/Pt thin film Schottky diode. The functional groups present in the CdIn<sub>2</sub>Se<sub>4</sub> thin films deposited on a platinum thin film substrate were determined using Fourier transform infrared spectroscopy.

RSC AdvancesVol. 15(50)
Bhavnagar University (IN), National Academy of Sciences of Belarus (BY), Saurashtra University (IN), Institute of Automation and Control Processes (RU), Far Eastern Branch of the Russian Academy of Sciences (RU), The Charutar Vidya Mandal (CVM) University
Belarusian Republican Foundation for Fundamental Research, Department of Science and Technology, Ministry of Science and Technology, India
Openalex Percentile: Top 74%
Semiconductor materials and interfaces
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