ION IMPLANTATION

Ion implantation is a low-temperature technique for the introduction of impurities (dopants) into semiconductors and offers more flexibility than diffusion. For instance, in MOS transistors, ion implantation can be used to accurately adjust the threshold voltage. A through study has been p[resented in the p[resent paper.]

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Publication Details

Journal
PARIPEX INDIAN JOURNAL OF RESEARCH
Published
2025-10-15
DOI
https://doi.org/10.36106/paripex/0505074
Primary Topic
Silicon and Solar Cell Technologies
Type
article
Field-Weighted Citation Impact
0.00
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article

ION IMPLANTATION

G.S. Virdi
PARIPEX INDIAN JOURNAL OF RESEARCH
Silicon and Solar Cell Technologies
article

ION IMPLANTATION

G.S. Virdi
article en

Abstract

Ion implantation is a low-temperature technique for the introduction of impurities (dopants) into semiconductors and offers more flexibility than diffusion. For instance, in MOS transistors, ion implantation can be used to accurately adjust the threshold voltage. A through study has been p[resented in the p[resent paper.]

PARIPEX INDIAN JOURNAL OF RESEARCH
Central Electronics Engineering Research Institute (IN)
Openalex Percentile: Top 68%
Silicon and Solar Cell Technologies
DOIOpen Access PDFOpenAlex
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ION IMPLANTATION — G.S. Virdi · PARIPEX INDIAN JOURNAL OF RESEARCH (2025) | TGRS Research Map | TGRS