Fiber laser-assisted room-temperature crystallization of solution-processed indium-rich IGO thin films for high-performance, high-reliability thin-film transistors

Solution-processed nanocrystalline oxide semiconductors with fiber laser-assisted post-treatment enable next-generation displays and sensors, combining large-area uniformity, low-cost fabrication, and high electrical performance.

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Publication Details

Journal
Journal of Materials Chemistry C
Published
2025-11-04
DOI
https://doi.org/10.1039/d5tc02983j
Citations
1
Primary Topic
Thin-Film Transistor Technologies
Type
article
Field-Weighted Citation Impact
0.73
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article

Fiber laser-assisted room-temperature crystallization of solution-processed indium-rich IGO thin films for high-performance, high-reliability thin-film transistors

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1 citations
Journal of Materials Chemistry C
Thin-Film Transistor Technologies
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article

Fiber laser-assisted room-temperature crystallization of solution-processed indium-rich IGO thin films for high-performance, high-reliability thin-film transistors

Hanlim Kang, Donghee Son, Min Han, Myung‐Gil Kim, Choongik Kim, Minki Son, Minh Nhut Le, Jae–Hyeok Cho, Sujin Shin, Ji‐Won Park, In Soo Kim, Bo-Ram Lee, Minjun Kim, Kyung-Hwan Min, Woo-Jin Oh, Van Thu Cao
article en
1 citations

Abstract

Solution-processed nanocrystalline oxide semiconductors with fiber laser-assisted post-treatment enable next-generation displays and sensors, combining large-area uniformity, low-cost fabrication, and high electrical performance.

Journal of Materials Chemistry CVol. 14(2)
Northwestern University (US), Georgia Institute of Technology (US), Sogang University (KR), Hyupsung University (KR), Sustainability Institute (ZA), Suwon Research Institute (KR), Institute for Basic Science (KR), Korea Institute of Science and Technology (KR), Sungkyunkwan University (KR)
Openalex Percentile: Top 22%
Thin-Film Transistor Technologies
0.73
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