High Temperature Operation and Spectral Stability of InGaN/GaN Ring Microlasers on Silicon

III-N ring microlasers on a silicon substrate with InGaN/GaN active layers emitting near 420 nm were investigated. The growth conditions and fabrication steps were optimized to realize stable lasing under optical pumping in cavities with a diameter of 6-10 μm. Chemically sensitive transmission electron microscopy images indicate that InGaN layers present in form of isolated islands. Between these InGaN islands, large areas of GaN are visible, forming barriers to lateral transport of free charge carriers in the active region and preventing their nonradiative surface recombination. For the first time, temperature stability of InGaN/GaN microring lasers characteristics are studied and lasing up to 100 degrees Celsius is demonstrated with the wavelength shift less than 1 nm. At room temperature, the threshold pump power is as low as 220 kW/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>. The obtained results significantly expand the potential areas of application of III-N microlasers.

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Publication Details

Journal
IEEE Photonics Technology Letters
Published
2025-11-03
DOI
https://doi.org/10.1109/lpt.2025.3628068
Primary Topic
Photonic and Optical Devices
Type
article
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article

High Temperature Operation and Spectral Stability of InGaN/GaN Ring Microlasers on Silicon

Sergey Komarov, К. А. Иванов, Е. В. Луценко, A. F. Tsatsul’nikov et al.
IEEE Photonics Technology Letters
Photonic and Optical Devices
article

High Temperature Operation and Spectral Stability of InGaN/GaN Ring Microlasers on Silicon

Sergey Komarov, К. А. Иванов, Е. В. Луценко, A. F. Tsatsul’nikov, Aliaksei G. Vainilovich, I. P. Smirnova, E. E. Zavarin, A. E. Zhukov, A. E. Nikolaev, L. K. Markov, D S Arteev, Ivan Makhov, A. A. Pivovarova, E. I. Moiseev, N. D. Il’inskaya, N. Cherkashin, N. V. Kryzhanovskaya, A. V. Sakharov, Dmitry A. Masyutin
article en

Abstract

III-N ring microlasers on a silicon substrate with InGaN/GaN active layers emitting near 420 nm were investigated. The growth conditions and fabrication steps were optimized to realize stable lasing under optical pumping in cavities with a diameter of 6-10 μm. Chemically sensitive transmission electron microscopy images indicate that InGaN layers present in form of isolated islands. Between these InGaN islands, large areas of GaN are visible, forming barriers to lateral transport of free charge carriers in the active region and preventing their nonradiative surface recombination. For the first time, temperature stability of InGaN/GaN microring lasers characteristics are studied and lasing up to 100 degrees Celsius is demonstrated with the wavelength shift less than 1 nm. At room temperature, the threshold pump power is as low as 220 kW/cm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>. The obtained results significantly expand the potential areas of application of III-N microlasers.

IEEE Photonics Technology LettersVol. 38(4)
National Research University Higher School of Economics (RU), Centre National de la Recherche Scientifique (FR), National Academy of Sciences of Belarus (BY), Université Fédérale de Toulouse Midi-Pyrénées (FR), B.I. Stepanov Institute of Physics (BY), Submicron Heterostructures for Microelectronics Research and Engineering Center (RU), Centre d’Élaboration de Matériaux et d’Études Structurales (FR), Ioffe Institute (RU)
Openalex Percentile: Top 68%
Photonic and Optical Devices
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