High-Frequency Modulation Characteristics Based on HfZrO Ferroelectric

This work investigates the application of HfZrO ferroelectric material for the tuning of high-frequency bandpass filters. By integrating HfZrO with a two-dimensional HfSe semiconductor to form a heterostructure, the device achieves wideband tunability with low power requirements. Under a bias of ±4 V, the bandpass filter demonstrates a 3.4 GHz tuning range—from 7.8 GHz to 11.2 GHz—corresponding to a fractional tunability of approximately 43% in the X-band. The insertion loss remains below −1.8 dB across the tuning window, indicating low-loss operation. These results highlight the potential of the HfZrO/HfSe heterostructure as a promising platform for energy-efficient, CMOS-compatible, high-frequency tunable devices.

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Publication Details

Journal
Inorganics
Published
2025-10-31
DOI
https://doi.org/10.3390/inorganics13110363
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

High-Frequency Modulation Characteristics Based on HfZrO Ferroelectric

J. Wang, Kexiang Wang, Yun Wen, Ran Jiang et al.
Inorganics
Ferroelectric and Negative Capacitance Devices
article

High-Frequency Modulation Characteristics Based on HfZrO Ferroelectric

J. Wang, Kexiang Wang, Yun Wen, Ran Jiang, Jie Lü, J. Zhou, Wenqing Xu, Haoyu Li, Meng Yu, Xinyu Cao, Zeyang Xiang
article en

Abstract

This work investigates the application of HfZrO ferroelectric material for the tuning of high-frequency bandpass filters. By integrating HfZrO with a two-dimensional HfSe semiconductor to form a heterostructure, the device achieves wideband tunability with low power requirements. Under a bias of ±4 V, the bandpass filter demonstrates a 3.4 GHz tuning range—from 7.8 GHz to 11.2 GHz—corresponding to a fractional tunability of approximately 43% in the X-band. The insertion loss remains below −1.8 dB across the tuning window, indicating low-loss operation. These results highlight the potential of the HfZrO/HfSe heterostructure as a promising platform for energy-efficient, CMOS-compatible, high-frequency tunable devices.

InorganicsVol. 13(11)
Ningbo University (CN), Hangzhou Wanxiang Polytechnic (CN), Qingdao Center of Resource Chemistry and New Materials (CN)
Ningbo University, Natural Science Foundation of Ningbo
Openalex Percentile: Top 68%
Ferroelectric and Negative Capacitance Devices
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