DC Sputtered Ultra-Thin Au Films and the Effect of Their Morphologies on Au-Catalyzed CIGS Films

Gold (Au) is one of the noble metals most used as a catalyst in the growth of one-dimensional nanostructures. Usually, an ultra-thin Au film is coated followed by thermal annealing to obtain Au nanoclusters. Although annealing temperature, duration and film thickness parameters have been heavily studied, there are no studies on the sputter working gas pressure, which also greatly affects the film microstructure. In this study, low (5 mTorr) and high (15 mTorr) working gas pressures were examined in addition to Au film thicknesses of 2 nm, 5 nm and 8 nm. Additionally, copper indium gallium selenide (CIGS) films were deposited on Au films with different thicknesses and argon (Ar) gas pressures. It was confirmed from SEM and AFM images that the Au films undergo drastic morphology change from smooth to extremely porous film surfaces with increasing thickness regardless of gas pressure. However, the porosity of films is increased at higher growth pressure for each thickness. Specifically, the most porous film was obtained at a 5 nm thickness with 15 mTorr, and it was filled with nanomounds. Not surprisingly, the only apparent columnar-type formation was observed for CIGS deposition, which was carried out on the most porous film. It can be interpreted that Au nanomounds behave like catalysts on which the CIGS nanocolumns grow.