Temperature-Dependent Reverse-Recovery Behavior Analysis and Circuit-Level Mitigation of Superjunction MOSFETs
This study explores the temperature dependence of reverse-recovery behavior in superjunction metal-oxide-semiconductor field-effect-transistors (MOSFETs) using experiments and Technology Computer-Aided Design (TCAD) simulations. Results show that at 145 °C, switching failure occurs due to severe reverse-recovery degradation. The main cause is the temperature-induced increase in carrier lifetime, leading to a higher reverse-recovery charge, current, and time. A practical solution is proposed by adding a small parallel capacitor, which effectively suppresses reverse recovery and improves switching reliability. This work provides physical insight and a simple strategy for optimizing superjunction MOSFET performance in high-temperature power electronics.
Authors
- Yafen Yang (ORCID: https://orcid.org/0000-0002-0785-9446)
- David Wei Zhang
- Hang Xu (ORCID: https://orcid.org/0000-0002-6784-5863)
- Jianbin Guo (ORCID: https://orcid.org/0009-0006-1038-4986)
- Yanghao Wang
- Peng Liao
- Wenrong Cui
Institutions
- Fudan University (CN)
- Shanghai Fudan Microelectronics (China) (CN)
Publication Details
- Journal
- Micromachines
- Published
- 2025-10-31
- DOI
- https://doi.org/10.3390/mi16111252
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00