Optimizing Electronic Topology of Curvature-Induced Cu–N <sub>2</sub> Asymmetric Structure for Maximized Cu Utilization in CH <sub>3</sub> SH Photo-oxidation

The highly symmetrical M-N<sub>4</sub> structure with dispersed atoms exhibits a symmetric charge distribution, which leads to strong binding with adsorbed molecules but reduces active site accessibility and limits electron utilization. Herein, the curvature effect of carbon nitride nanotubes (CNNTs) was employed to modulate the geometric and electronic topologies of curved Cu-N<sub>2</sub> asymmetric motifs. Surface stress induced the formation of unique "Cu protuberance" on CNNT, resulting in a maximum Cu atom dispersion of 5.66%, 13.8 times higher than that of the planar Cu-melon structure (0.41%). Additionally, the Cu-N<sub>2</sub> site acts as a reservoir for electrons, enhancing the accessibility of Cu sites. This improved electronic interaction with CH<sub>3</sub>SH decreased electron occupancy in the Cu 3d antibonding orbital and induced unconventional d-p hybridization between Cu and S atoms, thereby improving CH<sub>3</sub>SH photo-oxidation efficiency. Consequently, Cu-CNNT-400 with the optimal curvature radius exhibited the highest CH<sub>3</sub>SH removal efficiency (90.4%), demonstrating a volcano-like relationship between catalytic activity and nanotube diameter. Importantly, maximizing Cu atom utilization can effectively reduce the required amount of Cu precursors and lower catalyst costs. This study provides valuable insights into precise catalyst design for maximizing metal atom utilization in gaseous contaminant removal.

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Publication Details

Journal
JACS Au
Published
2025-11-03
DOI
https://doi.org/10.1021/jacsau.5c01083
Primary Topic
Catalytic Processes in Materials Science
Type
article
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article

Optimizing Electronic Topology of Curvature-Induced Cu–N 2 Asymmetric Structure for Maximized Cu Utilization in CH 3 SH Photo-oxidation

Xianhu Long, Dong Shu, Huinan Zhao, Shuanghong Tian et al.
JACS Au
Catalytic Processes in Materials Science
article

Optimizing Electronic Topology of Curvature-Induced Cu–N 2 Asymmetric Structure for Maximized Cu Utilization in CH 3 SH Photo-oxidation

Xianhu Long, Dong Shu, Huinan Zhao, Shuanghong Tian, Chun He, Tao Li, Tao Zhong, Zhangnan Yao
article en

Abstract

The highly symmetrical M-N<sub>4</sub> structure with dispersed atoms exhibits a symmetric charge distribution, which leads to strong binding with adsorbed molecules but reduces active site accessibility and limits electron utilization. Herein, the curvature effect of carbon nitride nanotubes (CNNTs) was employed to modulate the geometric and electronic topologies of curved Cu-N<sub>2</sub> asymmetric motifs. Surface stress induced the formation of unique "Cu protuberance" on CNNT, resulting in a maximum Cu atom dispersion of 5.66%, 13.8 times higher than that of the planar Cu-melon structure (0.41%). Additionally, the Cu-N<sub>2</sub> site acts as a reservoir for electrons, enhancing the accessibility of Cu sites. This improved electronic interaction with CH<sub>3</sub>SH decreased electron occupancy in the Cu 3d antibonding orbital and induced unconventional d-p hybridization between Cu and S atoms, thereby improving CH<sub>3</sub>SH photo-oxidation efficiency. Consequently, Cu-CNNT-400 with the optimal curvature radius exhibited the highest CH<sub>3</sub>SH removal efficiency (90.4%), demonstrating a volcano-like relationship between catalytic activity and nanotube diameter. Importantly, maximizing Cu atom utilization can effectively reduce the required amount of Cu precursors and lower catalyst costs. This study provides valuable insights into precise catalyst design for maximizing metal atom utilization in gaseous contaminant removal.

JACS AuVol. 5(11)
Sun Yat-sen University (CN), South China Normal University (CN), Guangdong Provincial Academy of Environmental Science (CN)
Openalex Percentile: Top 75%
Catalytic Processes in Materials Science
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