Laser processing of Ni-B coated Si-wafer: Simultaneous realization of selective emitters and copper barrier layers for TOPCon solar cells

Laser doping selective emitter (LDSE) technology has become a research hotspot in the large-scale production of silicon solar cells (SCs) due to its advantages of room-temperature processing, precise control of doping profiles, and short processing duration. In this study, a Ni-B alloy coating was chemically deposited on the front surface of n-type tunneling oxide passivated contact (TOPCon) crystalline silicon (c-Si) solar cell precursors, through which selective B doping and the formation of NiSi 2 metal seed layer were achieved during laser grooving process. Electrochemical capacitance-voltage (ECV) tests revealed a significant enhancement in carrier concentration, thereby confirming the successful doping of B. This process resulted in the formation of a locally heavily doped (p ++ ) layer, which effectively reduced the contact resistance (R c ) between the metal electrodes and Si substrate. Theoretical calculations indicated that the built-in potential (V bi ) of the pn junction increased, thereby enhancing built-in electric field (E bi ). This enhancement of the built-in electric field contributed to the improvement of both the open-circuit voltage (V oc ) and the short-circuit current density (J sc ), and significantly strengthened the adhesion between the metal electrodes and the Si substrate, ultimately leading to a comprehensive enhancement in the performance of the SCs. This study provides a new technical route to advance the industrial application of laser doping technology. • Simultaneously forming selective emitter and NiSi 2 phase. • This method successfully achieves heavy boron (B) doping, forming a heavily doped layer that strengthens the built-in electric field, thereby improving carrier separation efficiency and reducing recombination losses. • The R c and ρ c are significantly reduced, the adhesion between metal grid electrodes and the Si substrate is enhanced, and the J sc and V oc are remarkably improved.

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Publication Details

Journal
Materials Science in Semiconductor Processing
Published
2025-10-28
DOI
https://doi.org/10.1016/j.mssp.2025.110198
Primary Topic
Silicon and Solar Cell Technologies
Type
article
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article

Laser processing of Ni-B coated Si-wafer: Simultaneous realization of selective emitters and copper barrier layers for TOPCon solar cells

Xianli Huang, Jing Niu, Ruijie Zhang, Jianping He et al.
Materials Science in Semiconductor Processing
Silicon and Solar Cell Technologies
article

Laser processing of Ni-B coated Si-wafer: Simultaneous realization of selective emitters and copper barrier layers for TOPCon solar cells

Xianli Huang, Jing Niu, Ruijie Zhang, Jianping He, Jianbo Wang, Tao Wang, Miao Yu, Yuan Gao, Houfang Teng, Hui Yang
article en

Abstract

Laser doping selective emitter (LDSE) technology has become a research hotspot in the large-scale production of silicon solar cells (SCs) due to its advantages of room-temperature processing, precise control of doping profiles, and short processing duration. In this study, a Ni-B alloy coating was chemically deposited on the front surface of n-type tunneling oxide passivated contact (TOPCon) crystalline silicon (c-Si) solar cell precursors, through which selective B doping and the formation of NiSi 2 metal seed layer were achieved during laser grooving process. Electrochemical capacitance-voltage (ECV) tests revealed a significant enhancement in carrier concentration, thereby confirming the successful doping of B. This process resulted in the formation of a locally heavily doped (p ++ ) layer, which effectively reduced the contact resistance (R c ) between the metal electrodes and Si substrate. Theoretical calculations indicated that the built-in potential (V bi ) of the pn junction increased, thereby enhancing built-in electric field (E bi ). This enhancement of the built-in electric field contributed to the improvement of both the open-circuit voltage (V oc ) and the short-circuit current density (J sc ), and significantly strengthened the adhesion between the metal electrodes and the Si substrate, ultimately leading to a comprehensive enhancement in the performance of the SCs. This study provides a new technical route to advance the industrial application of laser doping technology. • Simultaneously forming selective emitter and NiSi 2 phase. • This method successfully achieves heavy boron (B) doping, forming a heavily doped layer that strengthens the built-in electric field, thereby improving carrier separation efficiency and reducing recombination losses. • The R c and ρ c are significantly reduced, the adhesion between metal grid electrodes and the Si substrate is enhanced, and the J sc and V oc are remarkably improved.

Materials Science in Semiconductor ProcessingVol. 202
Xian Mechanical & Electric Institute (China) (CN), Nanjing University of Aeronautics and Astronautics (CN)
Openalex Percentile: Top 69%
Silicon and Solar Cell Technologies
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