Wet etching of atomic-layer-deposited amorphous zinc–tin–oxide thin film using oxalic acid
This study investigates the wet etching process of amorphous Zn–Sn–O ( a -ZTO) thin films deposited by atomic layer deposition (ALD).
Authors
- Seo Young Jang
- Cheol Seong Hwang (ORCID: https://orcid.org/0000-0002-6254-9758)
- Sahngik Aaron Mun (ORCID: https://orcid.org/0009-0002-7097-7880)
- Jaesoon Choi (ORCID: https://orcid.org/0000-0002-6817-618X)
- Jinheon Choi
- Seoryong Park
- Hong Jip Kim (ORCID: https://orcid.org/0000-0002-8353-3413)
- Yonghee Lee (ORCID: https://orcid.org/0000-0001-8095-408X)
- Sukin Kang (ORCID: https://orcid.org/0000-0001-7174-9826)
- Jaewon Ham
Institutions
- SK Group (South Korea) (KR)
- Seoul National University (KR)
Publication Details
- Journal
- Journal of Materials Chemistry C
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5tc03481g
- Primary Topic
- ZnO doping and properties
- Type
- article
- Field-Weighted Citation Impact
- 0.00