Synthesis of molecularly tunable, dual-reactive poly(4-hydroxystyrene)-based photoresists <i>via</i> anionic polymerization, sequential deprotection, and reprotection reactions
The quantitatively introduced acetoxy and acetal groups in the controlled polymers can be selectively removed under basic and acidic conditions, respectively, enabling the formation of photoresists with precisely controlled compositions.
Authors
- Dong Jin Shin (ORCID: https://orcid.org/0000-0002-4390-2843)
- Sang‐Woog Ryu (ORCID: https://orcid.org/0000-0002-4728-2725)
Institutions
- Chungbuk National University (KR)
Publication Details
- Journal
- Polymer Chemistry
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d5py00941c
- Primary Topic
- Photopolymerization techniques and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00