Outside Back Cover: Rare Mononuclear Lithium–Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films (Angew. Chem. Int. Ed. 47/2025)

In the Research Article by Anjana Devi and co-workers (e202513066) a new N-heterocyclic carbene (NHC) stabilized lithium complex is introduced as a thermally stable atomic layer deposition (ALD) precursor. It features a rare mononuclear structure, suitable volatility, and a low melting point of 55 °C. ALD trials yielded lithium silicate films. This study opens new directions for NHC-ligand chemistry in thin-film deposition applications.

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Publication Details

Journal
Angewandte Chemie International Edition
Published
2025-10-26
DOI
https://doi.org/10.1002/anie.202522617
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
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article

Outside Back Cover: Rare Mononuclear Lithium–Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films (Angew. Chem. Int. Ed. 47/2025)

Arbresha Muriqi, Karl Rönnby, Detlef Rogalla, Jorit Obenlüneschloß et al.
Angewandte Chemie International Edition
Semiconductor materials and devices
article

Outside Back Cover: Rare Mononuclear Lithium–Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films (Angew. Chem. Int. Ed. 47/2025)

Arbresha Muriqi, Karl Rönnby, Detlef Rogalla, Jorit Obenlüneschloß, Michael Nolan, Edda Rädlein, Ulrike Brokmann, Volker Hoffmann, Nils Boysen, Carlos Abad, Anjana Devi
article en

Abstract

In the Research Article by Anjana Devi and co-workers (e202513066) a new N-heterocyclic carbene (NHC) stabilized lithium complex is introduced as a thermally stable atomic layer deposition (ALD) precursor. It features a rare mononuclear structure, suitable volatility, and a low melting point of 55 °C. ALD trials yielded lithium silicate films. This study opens new directions for NHC-ligand chemistry in thin-film deposition applications.

Angewandte Chemie International EditionVol. 64(47)
Technische Universität Ilmenau (DE), Federal Institute For Materials Research and Testing (DE), University Hospitals of the Ruhr-University of Bochum (DE), Leibniz Institute for Solid State and Materials Research (DE), Fraunhofer Institute for Microelectronic Circuits and Systems (DE), International Energy Research Centre (IE), Technische Universität Dresden (DE), Ruhr University Bochum (DE)
Openalex Percentile: Top 69%
Semiconductor materials and devices
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