Fabrication Process Research for Silicon-Waveguide-Integrated Cavity Optomechanical Devices Using Magnesium Fluoride Protection

As an emerging platform for high-precision sensing, integrated silicon-waveguide-based cavity optomechanical devices face a critical fabrication challenge in the co-fabrication of silicon-on-insulator (SOI) micromechanical structures and optical waveguides: the silicon oxide (SiO₂) layer beneath the waveguides is susceptible to etching during hydrofluoric acid (HF) release of the microstructures, leading to waveguide collapse and significantly reducing production yields. This study proposes a novel selective protection process based on a magnesium fluoride (MgF₂) thin film to address the critical challenge of long-range waveguide collapse during hydrofluoric acid (HF) etching. By depositing a MgF₂ protective layer over the waveguide regions via optical coating technology, localized protection of specific SiO₂ areas during HF etching is achieved. The experimental results demonstrate the successful release of silicon waveguides with lengths of up to 5000 μm and a significant improvement in production yield. This work provides a compatible and efficient strategy for the fabrication of robust photonic-microelectromechanical integrated devices.