Quantum spin Hall effect in III-V semiconductors at elevated temperatures: Advancing topological electronics

The quantum spin Hall effect (QSHE), a hallmark of topological insulators, enables dissipationless, spin-polarized edge transport and has been predicted in various two-dimensional materials. However, challenges such as limited scalability, low-temperature operation, and the lack of robust electronic transport have hindered practical implementations. Here, we demonstrate the QSHE in an InAs/GaInSb/InAs trilayer quantum well structure operating at elevated temperatures. This platform meets key criteria for device integration, including scalability, reproducibility, and tunability via electric field. When the Fermi level is positioned within the energy gap, we observe quantized resistance values independent of device length and in both local and nonlocal measurement configurations, confirming the QSHE. Helical edge transport remains stable up to <i>T</i> = 60 kelvin, with further potential for higher-temperature operation. Our findings establish the InAs/GaInSb system as a promising candidate for integration into next-generation devices harnessing topological functionalities, advancing the development of topological electronics.

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Publication Details

Journal
Science Advances
Published
2025-10-24
DOI
https://doi.org/10.1126/sciadv.adz2408
Citations
1
Primary Topic
Topological Materials and Phenomena
Type
article
Field-Weighted Citation Impact
1.25
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article

Quantum spin Hall effect in III-V semiconductors at elevated temperatures: Advancing topological electronics

Manuel Meyer, B. Jouault, Jean‐Baptiste Rodriguez, M. Kamp et al.
1 citations
Science Advances
Topological Materials and Phenomena
1.25
article

Quantum spin Hall effect in III-V semiconductors at elevated temperatures: Advancing topological electronics

Manuel Meyer, B. Jouault, Jean‐Baptiste Rodriguez, M. Kamp, Fabian Hartmann, Sven Höfling, A. Wolf, F. Teppe, S. S. Krishtopenko, G. Bastard, Eric Tournié, Monika Emmerling, Tobias Müller, Ronny Thomale, Sebastian C. Schmid, J. I. Baumbach
article en
1 citations

Abstract

The quantum spin Hall effect (QSHE), a hallmark of topological insulators, enables dissipationless, spin-polarized edge transport and has been predicted in various two-dimensional materials. However, challenges such as limited scalability, low-temperature operation, and the lack of robust electronic transport have hindered practical implementations. Here, we demonstrate the QSHE in an InAs/GaInSb/InAs trilayer quantum well structure operating at elevated temperatures. This platform meets key criteria for device integration, including scalability, reproducibility, and tunability via electric field. When the Fermi level is positioned within the energy gap, we observe quantized resistance values independent of device length and in both local and nonlocal measurement configurations, confirming the QSHE. Helical edge transport remains stable up to <i>T</i> = 60 kelvin, with further potential for higher-temperature operation. Our findings establish the InAs/GaInSb system as a promising candidate for integration into next-generation devices harnessing topological functionalities, advancing the development of topological electronics.

Science AdvancesVol. 11(43)
Centre National de la Recherche Scientifique (FR), Institut Universitaire de France (FR), Université de Montpellier (FR), University of Zurich (CH), University of Würzburg (DE), École Normale Supérieure - PSL (FR), Laboratoire Charles Coulomb (FR)
Openalex Percentile: Top 16%
Topological Materials and Phenomena
1.25
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