Two-stage op-amp with a low-voltage cascode load

A two-stage operational amplifier in 0.18-μm CMOS is presented to address the gain-swing trade-off in low-voltage designs. By employing an optimized low-voltage cascode current mirror as the active load, the proposed architecture achieves both high output impedance and wide voltage swing. Verified by post-layout simulations at 1.8 V, the op-amp exhibits a high gain of 95.51 dB, a slew rate of 75.76 V/μs, and excellent CMRR/PSRR above 95 dB, validating its effectiveness for high-performance analog applications. The design's robustness is validated across −40°C to 125°C and TT/SS/FF process corners, showing stable DC and large-signal performance despite layout-induced bandwidth degradation. Power consumption remains low and consistent across all conditions.

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Publication Details

Journal
IET conference proceedings.
Published
2025-10-01
DOI
https://doi.org/10.1049/icp.2025.3042
Primary Topic
Advanced MEMS and NEMS Technologies
Type
article
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article

Two-stage op-amp with a low-voltage cascode load

Yicheng Jia, Kai Gong, Qin Pan
IET conference proceedings.
Advanced MEMS and NEMS Technologies
article

Two-stage op-amp with a low-voltage cascode load

Yicheng Jia, Kai Gong, Qin Pan
article en

Abstract

A two-stage operational amplifier in 0.18-μm CMOS is presented to address the gain-swing trade-off in low-voltage designs. By employing an optimized low-voltage cascode current mirror as the active load, the proposed architecture achieves both high output impedance and wide voltage swing. Verified by post-layout simulations at 1.8 V, the op-amp exhibits a high gain of 95.51 dB, a slew rate of 75.76 V/μs, and excellent CMRR/PSRR above 95 dB, validating its effectiveness for high-performance analog applications. The design's robustness is validated across −40°C to 125°C and TT/SS/FF process corners, showing stable DC and large-signal performance despite layout-induced bandwidth degradation. Power consumption remains low and consistent across all conditions.

IET conference proceedings.Vol. 2025(24)
Shanghai University (CN)
Openalex Percentile: Top 70%
Advanced MEMS and NEMS Technologies
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