Electrical Characterization and Simulation of GaN-on-Si Pseudo-Vertical MOSFETs with Frequency-Dependent Gate C–V Investigation

This work presents a comprehensive study of GaN-on-Si pseudo-vertical MOSFETs focusing on single-trench and multi-trench designs. Thanks to a gate-first process flow based on an Al₂O₃/TiN MOS stack, both fabricated devices exhibit promising transistor behavior, with steady normally OFF operation, very low gate leakage current, and good switching performance. Following the extraction of a low effective channel mobility, the frequency dependence of gate-to-source C-V characteristics is studied. In addition, using TCAD Sentaurus Synopsys simulations, the impact of positive fixed charge and donor-type defects at the p-GaN/dielectric interface is investigated, together with the frequency dependency. Finally, by comparing experimental and simulated results, a mechanism is proposed linking the observed threshold voltage shift to the presence of sharp trench-bottom micro-trenching. This mechanism may further explain the origin of the additional C-V hump observed at high frequencies, which could arise from charge trapping at the p-GaN/dielectric interface or from charge inversion in the p-GaN region.