Mode optimization in a 1550 nm VCSEL based on mesa-dielectric film synergistic regulation
This study presents an optimized method for achieving high-order mode suppression and single-mode stabilization in InP-based VCSELs through synergistic control of mesa and dielectric film structures. By adjusting the mesa width and dielectric film width-two critical parameters significantly affecting mode characteristics-transverse modes can be effectively regulated. Simulation results demonstrate that these structures synergistically control optical field profiles, enhancing mode stability without compromising output efficiency. The parameters precisely regulate transverse mode quantity, volume, and stability, while a newly defined parameter, to our knowledge, the effective modal gain, improves mode identification. These optimization strategies provide an effective solution for advanced mode control in InP-VCSEL systems, offering significant improvements in laser performance.
Authors
- Yu Cao (ORCID: https://orcid.org/0000-0003-2460-2228)
- Yijie Pan
- Yinli Zhou
- Chao Chen (ORCID: https://orcid.org/0000-0002-2311-1462)
- Lijun Wang (ORCID: https://orcid.org/0009-0004-5376-8029)
- Jian Zhang (ORCID: https://orcid.org/0000-0003-0856-8461)
- Tianqi Zhang (ORCID: https://orcid.org/0009-0002-4026-0555)
- Xiaoyan Gao (ORCID: https://orcid.org/0000-0002-1622-4848)
- Zhuo Zhang (ORCID: https://orcid.org/0000-0003-3243-1019)
- Yongqiang Ning
- Gaohui yuan
- 刘天娇 Liu Tianjiao
Institutions
- FORCE Technology (Norway) (NO)
Publication Details
- Journal
- Applied Optics
- Published
- 2025-10-21
- DOI
- https://doi.org/10.1364/ao.576360
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00