Impact of BN Buffer Layer Thickness on Interfacial Structure and Band Alignment of a-BN/4H-SiC Heterojunctions

This study provides a comprehensive investigation into the growth behavior of boron nitride (BN) buffer layers on Silicon carbide (SiC) substrates and their influence on interfacial band alignment. BN layers were deposited on semi-insulating SiC by RF magnetron sputtering with deposition times of 2.5, 5, and 7.5 min (these deposition times are specific experimental parameters to adjust the thickness of the amorphous BN layer, not intrinsic material properties of BN). Atomic force microscopy revealed that the surface roughness of the BN layers initially decreased and then increased with thickness, indicating an evolution from nucleation to continuous film formation, followed by surface coarsening. Transmission electron microscopy confirmed the BN thicknesses of approximately 3.25, 4.91, and 7.57 nm, showing that the layers gradually became uniform and compact, thereby improving the structural integrity of the BN/SiC interface. Band alignment was analyzed using the Kraut method, yielding a valence band offset of ~0.36 eV and a conduction band offset of ~2.34 eV for the BN/SiC heterojunction. This alignment indicates that the BN buffer layer introduces a pronounced electron barrier, effectively suppressing leakage, while the relatively small VBO facilitates hole transport across the interface. These findings demonstrate that the BN buffer layer enhances interfacial bonding, reduces defect states, and enables band structure engineering, offering a promising strategy for improving the performance of wide-bandgap semiconductor devices.