Implantation studies of low-energy positive muons in niobium thin films
Here we study the range of ke V positive muons μ + implanted in Nb 2 O 5 ( x nm)/Nb( y nm)/SiO 2 (300 nm)/Si [ x = 3 . 6 nm , 3 . 3 nm ; y = 42 . 0 nm , 60 . 1 nm ] thin films using low-energy muon spin spectroscopy (LE- μ SR). At implantation energies 1 . 3 keV ≤ E ≤ 23 . 3 keV , we compare the measured diamagnetic μ + signal fraction f dia. against predictions derived from implantation profile simulations using the TRIM.SP Monte Carlo code. Treating the implanted μ + as light protons p + , we find that simulations making use of updated stopping cross section data are in good agreement with the LE- μ SR measurements, in contrast to parameterizations found in earlier tabulations. Implications for other studies relying on accurate μ + stopping information are discussed.
Authors
- Thomas Prokscha (ORCID: https://orcid.org/0000-0002-7643-4695)
- Andreas Suter (ORCID: https://orcid.org/0000-0002-9214-6474)
- Z. Salman (ORCID: https://orcid.org/0000-0002-3431-8135)
- Angelo Di Bernardo (ORCID: https://orcid.org/0000-0002-2912-2023)
- Arnold Müller (ORCID: https://orcid.org/0009-0008-9552-075X)
- Leon Ruf (ORCID: https://orcid.org/0009-0005-3828-2669)
- Tobias Junginger (ORCID: https://orcid.org/0000-0002-2228-2809)
- Ryan M. L. McFadden (ORCID: https://orcid.org/0000-0002-1389-2410)
Institutions
- TRIUMF (CA)
- University of Salerno (IT)
- University of Konstanz (DE)
- University of Victoria (CA)
- Paul Scherrer Institute (CH)
- Ion Beam Applications (France) (FR)
Publication Details
- Journal
- Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
- Published
- 2025-11-24
- DOI
- https://doi.org/10.1016/j.nimb.2025.165954
- Primary Topic
- Muon and positron interactions and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00