Polycrystalline Morphology and Anomalous Hall Effect in RF-Sputtered Co2MnGa Films

The Heusler compound Co2MnGa is a topological semimetal with intriguing electronic and magnetic properties, making it a promising candidate for spintronic applications. This study systematically investigates the effects of substrate temperature and RF sputtering power on the structure, morphology, and anomalous Hall effect (AHE) in Co2MnGa thin films. Using X-ray diffraction line analysis, we identify variations in film orientation and crystallinity, revealing the emergence of high-index textures at specific growth conditions. Atomic force microscopy imaging provide insight into grain morphology and size distributions demonstrating a correlation between deposition parameters and film texture. Hall transport measurements confirm a strong dependence of AHE on growth conditions, exhibiting a non-monotonic relationship with RF power and temperature. Despite significant variations in microstructure, a striking linear relationship between AHE and the zero-field slope of the Hall resistivity is observed, suggesting an underlying universal mechanism. These findings provide a foundation for investigating the complex interplay of CMG thin film conditions and transport for next-generation magnetic and electronic devices.