Recent Advancements and Emerging Applications in Atomic Layer Deposition (ALD) on High-Porosity Materials

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SPIRE - Sciences Po Institutional REpository
Published
2024-10-06
Primary Topic
Semiconductor materials and devices
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article
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article

Recent Advancements and Emerging Applications in Atomic Layer Deposition (ALD) on High-Porosity Materials

Mikhaël Bechelany
SPIRE - Sciences Po Institutional REpository
Semiconductor materials and devices
article

Recent Advancements and Emerging Applications in Atomic Layer Deposition (ALD) on High-Porosity Materials

Mikhaël Bechelany
article en

Abstract

No abstract available for this paper.
SPIRE - Sciences Po Institutional REpository
Institut Européen des Membranes (FR)
Openalex Percentile: Top 71%
Semiconductor materials and devices
OpenAlex
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Recent Advancements and Emerging Applications in Atomic Layer Deposition (ALD) on High-Porosity Materials — Mikhaël Bechelany · SPIRE - Sciences Po Institutional REpository (2024) | TGRS Research Map | TGRS