Recent Progresses in Direct Photolithographic Patterning of Quantum Dots

Luminous quantum dots (QDs) are highly attractive materials for advanced display technologies due to their exceptional optical properties, including strong absorption, narrow emission spectra, and high photoluminescence quantum yields. These characteristics enable their use in next-generation microdisplays requiring high brightness, superior color purity, broad color gamut, and fast response times. Among various fabrication techniques, direct photolithographic patterning of QDs stands out as a highly reliable method for creating QD pixel arrays. This approach offers significant advantages in terms of resolution, throughput, response time, scalability, and seamless integration with conventional micro/nanofabrication processes. This review critically examines recent progress in direct photolithographic patterning of QDs for microdisplay applications. We particularly focus on the underlying light-responsive mechanisms of QD surface ligand engineering and the development of QD–polymer composites. Furthermore, we evaluate the performance of the resulting patterned QD microstructures in actual microdisplay applications. Finally, we address the current challenges in practical implementation and propose future directions for the advancement of QD direct lithographic patterning techniques, with the aim of providing valuable insights for continued innovation in this rapidly evolving field.