Study on Development of Hydrogen Peroxide Generation Reactor with Pin-to-Water Atmospheric Discharges
We present an experimentally validated, engineering-oriented framework for the design and operation of pin-to-water (PTW) atmospheric discharges to produce hydrogen peroxide (H2O2) on demand. Motivated by industrial needs for safe, point-of-use oxidant supply, we combine time-resolved diagnostics (FTIR, OES), liquid-phase analysis (ion chromatography, pH, conductivity), and coupled plasma-chemistry/fluid simulations to link plasma state to aqueous H2O2 yield. Under the tested conditions (14.3 kHz, 0.2 kW; electrode to quartz wall distance 12–14 mm; coolant setpoints 0–40 °C), H2O2 concentration follows a reproducible non-monotonic trajectory: rapid accumulation during the early treatment (typical peak at ~15–25 min), followed by decline with continued operation. The decline coincides with a robust vibrational-temperature (Tvib) threshold near ~4900 K measured from N2 emission, and with concurrent NOX accumulation and bulk acidification. Global chemistry modeling and Fluent flow fields reproduce the observed trend and show that both vibrational excitation (kinetics) and convective transport (mass/heat transfer) determine the productive time window. Based on these results, we formulate practical design rules—electrode gap (power density), discharge current control, thermal/flow management, water quality, and OES-based Tvib monitoring with an automated stop rule—that maximize H2O2 yield while avoiding NOX-dominated suppression. The study provides a clear path for transforming mechanistic plasma insights into deployable, industrial H2O2 generator designs.
Authors
- Seungmin Ryu (ORCID: https://orcid.org/0000-0002-0001-2963)
- Sangheum Eom (ORCID: https://orcid.org/0000-0001-5742-0127)
- Seong Bong Kim (ORCID: https://orcid.org/0000-0002-0472-8694)
- Seungil Park (ORCID: https://orcid.org/0000-0002-6209-4271)
- Eun Jeong Hong (ORCID: https://orcid.org/0000-0001-7391-379X)
- Junghyun Lim
- Sung-Young Yoon (ORCID: https://orcid.org/0000-0003-0118-8474)
Institutions
- Plasma Technology (United States) (US)
Publication Details
- Journal
- Plasma
- Published
- 2025-10-14
- DOI
- https://doi.org/10.3390/plasma8040041
- Citations
- 1
- Primary Topic
- Plasma Applications and Diagnostics
- Type
- article
- Field-Weighted Citation Impact
- 1.36
Funders
- Ministry of Science and ICT, South Korea