SOT-MRAM Bitcell Scaling With BEOL Read Selectors: A DTCO Study
This work explores the cross-node scaling potential of SOT-MRAM for last-level caches (LLCs) under heterogeneous system scaling paradigm. We perform extensive design-technology co-optimization (DTCO) exercises to evaluate the bitcell footprint for different cell configurations at a representative 7 nm technology and to assess their implications on read and write power-performance. We crucially identify the MTJ routing struggle in conventional two-transistor one-resistor (2T1R) SOT-MRAMs as the primary bitcell area scaling challenge and propose to use BEOL read selectors (BEOL RSs) that enable (10%–40%) bitcell area reduction and eventually match sub-N3 SRAM. On writability, we affirm that BEOL RS-based bitcells could meet the required SOT switching current, provided the magnetic free layer properties be engineered in line with LLC-specific, (0.1–100) s retention targets. This is particularly to attribute to their: 1) more available Si fins for write transistor (WRT) and 2) lower bitline resistance at reduced cell width. We nevertheless underscore the read tradeoff associated with BEOL RSs, with the low-drive IGZO-FET selector sacrificing the latency up to (3–5) ns and the imperfectly rectifying diode selectors suffering (2.5–5)<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\times $</tex-math> </inline-formula> energy cost relative to 2T1R. This article thus highlights the realistic prospects and hurdles of BEOL RSs toward holistic power-performance-area (PPA) scaling of SOT-MRAM.
Authors
- Subhali Subhechha (ORCID: https://orcid.org/0000-0002-1960-5136)
- Siddharth Rao (ORCID: https://orcid.org/0000-0001-6161-3052)
- Philippe Matagne (ORCID: https://orcid.org/0000-0003-0365-2066)
- V.D. Nguyen (ORCID: https://orcid.org/0000-0001-6924-4298)
- Mumtaz Baig (ORCID: https://orcid.org/0000-0003-1931-4993)
- Lynn Verschueren (ORCID: https://orcid.org/0000-0002-2941-769X)
- A. Fantini (ORCID: https://orcid.org/0000-0002-3220-8856)
- Fernando Garćıa-Redondo (ORCID: https://orcid.org/0000-0001-7090-8821)
- Geert Hellings (ORCID: https://orcid.org/0000-0002-5376-2119)
- M. Garcia Bardon (ORCID: https://orcid.org/0000-0001-5772-5406)
- Yang Xiang (ORCID: https://orcid.org/0000-0003-0091-6935)
- Arvind Sharma (ORCID: https://orcid.org/0000-0002-9250-9642)
Institutions
- IMEC (BE)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-10-14
- DOI
- https://doi.org/10.1109/ted.2025.3617043
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00