Influence of pixel size and gap on the optoelectronic performance of micro-LED arrays for visible light communication using boron ion implantation
This study investigated the impact of pixel size and inter-pixel gap width on the optoelectronic performance of micro-LED arrays, with a particular focus on their application in visible light communication (VLC). Boron ion implantation was employed to define pixel emission areas and achieve effective channel insulation due to boron's small atomic radius and its ability to suppress electrical conductivity in implanted regions without significantly degrading the optical performance. The micro-LED arrays, with a total emitting area of 14,400 μm², incorporated pixel sizes of 5 μm, 8 μm, and 10 μm, alongside gap widths of 2 μm, 4 μm, 6 μm, and 8 μm. The experimental results demonstrated a consistent increase in light output power and external quantum efficiency (EQE) with decreasing gap widths, which is attributed to reduced leakage currents and minimized non-radiative recombination losses. The small size of boron ions allowed for precise electrical isolation between pixels without affecting emission properties, enabling accurate evaluation of size-dependent performance. In VLC applications, pixel size and gap width not only influenced light output power and EQE but also impacted bandwidth, full-width at half-maximum, and data transmission rates. The 12 × 12 array with a 10 μm pixel size achieved the best VLC performance, with a bandwidth of 171.88 MHz at a current density of 347.2 A/cm².
Authors
- Ching‐Ho Tien (ORCID: https://orcid.org/0000-0002-8731-5157)
- Tae‐Yeon Seong (ORCID: https://orcid.org/0000-0003-0761-3363)
- Ray‐Hua Horng (ORCID: https://orcid.org/0000-0002-1160-6775)
- Po-Chiao Wang
- Chien-Chi Huang (ORCID: https://orcid.org/0009-0000-7028-7033)
- Hao-Chung Kuo
- Chien‐Chung Lin (ORCID: https://orcid.org/0000-0001-8656-1922)
Institutions
- Linköping University (SE)
- National Yang Ming Chiao Tung University (TW)
- National Taiwan University (TW)
- Tunghai University (TW)
- Korea University (KR)
- Thinfilm (Sweden) (SE)
- Industrial Technology Research Institute (TW)
Publication Details
- Journal
- Discover Nano
- Published
- 2025-10-14
- DOI
- https://doi.org/10.1186/s11671-025-04366-9
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Shanghai Educational Development Foundation
- Linköpings Universitet
- Ministry of Education, India
- National Science and Technology Council