Breaking the Dose Barrier in PMMA: Metal Oxide–Induced Hybrid Strategy for Negative-Tone Lithography
As continued device scaling demands thinner photoresists with enhanced sensitivity and etch resistance, organic-inorganic hybrid resists have emerged as promising candidates by combining the processability of polymers with the mechanical robustness of
Authors
- Jiwoong Ham (ORCID: https://orcid.org/0000-0001-7602-7566)
- Nari Jeon (ORCID: https://orcid.org/0000-0002-8240-744X)
- Minkyung Ko (ORCID: https://orcid.org/0000-0003-1307-0924)
- Young Heon Kim (ORCID: https://orcid.org/0000-0001-9944-5859)
Institutions
- Chungnam National University (KR)
Publication Details
- Published
- 2025-10-13
- DOI
- https://doi.org/10.22541/au.176038042.23290895/v1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00