Ultra-high withstand voltage (>120 kV cm<sup>–1</sup>) sub-nanosecond (<0.5 ns) aluminum nitride photoconductive semiconductor switch

光电导开关(Photoconductive Semiconductor Switch, PCSS)是超宽带雷达及脉冲功率系统中的关键器件. 提高其输出功率与响应速度是当前PCSS研究的重要目标. 随着超宽禁带半导体材料制备技术的成熟, 发展高性能PCSS获得了新的途径. 氮化铝(AlN)作为超宽禁带半导体材料(带隙宽度~6.2 eV), 同时具备超高击穿场强、高热导率及高电子饱和速度等优异特性, 有望用于制造高功率、超快响应PCSS器件. 本研究采用高质量AlN单晶制备了PCSS器件. 测试结果表明, 该器件输出稳定性良好, 并能在偏置电场强度高达120 kV/cm的条件下正常工作, 器件响应时间优于激光脉宽, 上升时间小于0.5 ns, 达到亚纳秒量级. 本研究结果表明了AlN基PCSS在大功率宽谱信号输出方面具备巨大潜力.

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Publication Details

Journal
Chinese Science Bulletin (Chinese Version)
Published
2025-10-10
DOI
https://doi.org/10.1360/csb-2025-5146
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

Ultra-high withstand voltage (>120 kV cm–1) sub-nanosecond (<0.5 ns) aluminum nitride photoconductive semiconductor switch

Wei Zheng, Kai Duan, Lixin Zhang, Zhao Wang
Chinese Science Bulletin (Chinese Version)
GaN-based semiconductor devices and materials
article

Ultra-high withstand voltage (>120 kV cm–1) sub-nanosecond (<0.5 ns) aluminum nitride photoconductive semiconductor switch

Wei Zheng, Kai Duan, Lixin Zhang, Zhao Wang
article en

Abstract

光电导开关(Photoconductive Semiconductor Switch, PCSS)是超宽带雷达及脉冲功率系统中的关键器件. 提高其输出功率与响应速度是当前PCSS研究的重要目标. 随着超宽禁带半导体材料制备技术的成熟, 发展高性能PCSS获得了新的途径. 氮化铝(AlN)作为超宽禁带半导体材料(带隙宽度~6.2 eV), 同时具备超高击穿场强、高热导率及高电子饱和速度等优异特性, 有望用于制造高功率、超快响应PCSS器件. 本研究采用高质量AlN单晶制备了PCSS器件. 测试结果表明, 该器件输出稳定性良好, 并能在偏置电场强度高达120 kV/cm的条件下正常工作, 器件响应时间优于激光脉宽, 上升时间小于0.5 ns, 达到亚纳秒量级. 本研究结果表明了AlN基PCSS在大功率宽谱信号输出方面具备巨大潜力.

Chinese Science Bulletin (Chinese Version)Vol. 71(9)
Openalex Percentile: Top 82%
GaN-based semiconductor devices and materials
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