Deep-learning-driven automation of inner and outer object segmentation in SEM/TEM imaging for semiconductor metrology

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Publication Details

Journal
Journal of Micro/Nanopatterning Materials and Metrology
Published
2025-10-09
DOI
https://doi.org/10.1117/1.jmm.24.4.041406
Primary Topic
Electron and X-Ray Spectroscopy Techniques
Type
article
Field-Weighted Citation Impact
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article

Deep-learning-driven automation of inner and outer object segmentation in SEM/TEM imaging for semiconductor metrology

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Journal of Micro/Nanopatterning Materials and Metrology
Electron and X-Ray Spectroscopy Techniques
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Deep-learning-driven automation of inner and outer object segmentation in SEM/TEM imaging for semiconductor metrology

Isaac Wilfried Sanou, Ali Hallal, Vincent Barra, Julien Baderot, J. Foucher, Léo Mazauric
article en

Abstract

No abstract available for this paper.
Journal of Micro/Nanopatterning Materials and MetrologyVol. 24(04)
Centre National de la Recherche Scientifique (FR), Université Clermont Auvergne (FR), Laboratoire d'Informatique, de Modélisation et d'Optimisation des Systèmes (FR)
Openalex Percentile: Top 73%
Electron and X-Ray Spectroscopy Techniques
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