Spin properties in droplet epitaxy grown telecom quantum dots

We investigate the spin properties of InAs/InGaAs/InP quantum dots grown by metalorganic vapor-phase epitaxy (MOVPE) deposition using droplet epitaxy, which emits in the telecom C band. Using pump-probe Faraday ellipticity measurements, we determine electron and hole <a:math xmlns:a="http://www.w3.org/1998/Math/MathML"> <a:mi>g</a:mi> </a:math> factors of <b:math xmlns:b="http://www.w3.org/1998/Math/MathML"> <b:mrow> <b:mrow> <b:mo>|</b:mo> </b:mrow> <b:msub> <b:mi>g</b:mi> <b:mi>e</b:mi> </b:msub> <b:mrow> <b:mo>|</b:mo> <b:mo>=</b:mo> <b:mn>0.93</b:mn> </b:mrow> </b:mrow> </b:math> and <c:math xmlns:c="http://www.w3.org/1998/Math/MathML"> <c:mrow> <c:mrow> <c:mo>|</c:mo> </c:mrow> <c:msub> <c:mi>g</c:mi> <c:mi>h</c:mi> </c:msub> <c:mrow> <c:mo>|</c:mo> <c:mo>=</c:mo> <c:mn>0.47</c:mn> </c:mrow> </c:mrow> </c:math> , with the electron <d:math xmlns:d="http://www.w3.org/1998/Math/MathML"> <d:mi>g</d:mi> </d:math> factor being nearly twice as low as typical molecular beam epitaxy Stranski-Krastanov (SK) grown samples. Most significantly, we measure a longitudinal spin relaxation time <e:math xmlns:e="http://www.w3.org/1998/Math/MathML"> <e:mrow> <e:msub> <e:mi>T</e:mi> <e:mn>1</e:mn> </e:msub> <e:mo>=</e:mo> <e:mn>3.0</e:mn> <e:mspace width="4pt"/> <e:mrow> <e:mi>µ</e:mi> <e:mi mathvariant="normal">s</e:mi> </e:mrow> </e:mrow> </e:math> , representing an order of magnitude improvement over comparable MBE SK grown samples. Despite significant electron <h:math xmlns:h="http://www.w3.org/1998/Math/MathML"> <h:mi>g</h:mi> </h:math> -factor anisotropy, we observed that it is reduced relative to similar material composition samples grown with MBE or MOVPE SK methods. We attribute this <i:math xmlns:i="http://www.w3.org/1998/Math/MathML"> <i:mi>g</i:mi> </i:math> -factor anisotropy and spin lifetime improvements to the enhanced structural symmetry achieved via MOVPE droplet epitaxy, which mitigates the inherent structural asymmetry in strain-driven growth approaches for InAs/InP quantum dots. These results demonstrate that MOVPE droplet epitaxy-grown InAs/InGaAs/InP quantum dots exhibit favorable spin properties for potential implementation in quantum information applications.

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Physical review. B./Physical review. B
Published
2025-09-25
DOI
https://doi.org/10.1103/bm22-smcp
Citations
1
Primary Topic
Semiconductor Quantum Structures and Devices
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article
Field-Weighted Citation Impact
1.25
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article

Spin properties in droplet epitaxy grown telecom quantum dots

M. Bayer, A. Greilich, Jon Heffernan, Elisa Maddalena Sala et al.
1 citations
Physical review. B./Physical review. B
Semiconductor Quantum Structures and Devices
1.25
article

Spin properties in droplet epitaxy grown telecom quantum dots

M. Bayer, A. Greilich, Jon Heffernan, Elisa Maddalena Sala, A. M. Fox, Marius Cizauskas
article en
1 citations

Abstract

We investigate the spin properties of InAs/InGaAs/InP quantum dots grown by metalorganic vapor-phase epitaxy (MOVPE) deposition using droplet epitaxy, which emits in the telecom C band. Using pump-probe Faraday ellipticity measurements, we determine electron and hole <a:math xmlns:a="http://www.w3.org/1998/Math/MathML"> <a:mi>g</a:mi> </a:math> factors of <b:math xmlns:b="http://www.w3.org/1998/Math/MathML"> <b:mrow> <b:mrow> <b:mo>|</b:mo> </b:mrow> <b:msub> <b:mi>g</b:mi> <b:mi>e</b:mi> </b:msub> <b:mrow> <b:mo>|</b:mo> <b:mo>=</b:mo> <b:mn>0.93</b:mn> </b:mrow> </b:mrow> </b:math> and <c:math xmlns:c="http://www.w3.org/1998/Math/MathML"> <c:mrow> <c:mrow> <c:mo>|</c:mo> </c:mrow> <c:msub> <c:mi>g</c:mi> <c:mi>h</c:mi> </c:msub> <c:mrow> <c:mo>|</c:mo> <c:mo>=</c:mo> <c:mn>0.47</c:mn> </c:mrow> </c:mrow> </c:math> , with the electron <d:math xmlns:d="http://www.w3.org/1998/Math/MathML"> <d:mi>g</d:mi> </d:math> factor being nearly twice as low as typical molecular beam epitaxy Stranski-Krastanov (SK) grown samples. Most significantly, we measure a longitudinal spin relaxation time <e:math xmlns:e="http://www.w3.org/1998/Math/MathML"> <e:mrow> <e:msub> <e:mi>T</e:mi> <e:mn>1</e:mn> </e:msub> <e:mo>=</e:mo> <e:mn>3.0</e:mn> <e:mspace width="4pt"/> <e:mrow> <e:mi>µ</e:mi> <e:mi mathvariant="normal">s</e:mi> </e:mrow> </e:mrow> </e:math> , representing an order of magnitude improvement over comparable MBE SK grown samples. Despite significant electron <h:math xmlns:h="http://www.w3.org/1998/Math/MathML"> <h:mi>g</h:mi> </h:math> -factor anisotropy, we observed that it is reduced relative to similar material composition samples grown with MBE or MOVPE SK methods. We attribute this <i:math xmlns:i="http://www.w3.org/1998/Math/MathML"> <i:mi>g</i:mi> </i:math> -factor anisotropy and spin lifetime improvements to the enhanced structural symmetry achieved via MOVPE droplet epitaxy, which mitigates the inherent structural asymmetry in strain-driven growth approaches for InAs/InP quantum dots. These results demonstrate that MOVPE droplet epitaxy-grown InAs/InGaAs/InP quantum dots exhibit favorable spin properties for potential implementation in quantum information applications.

Physical review. B./Physical review. BVol. 112(16)
TU Dortmund University (DE), University of Sheffield (GB)
Openalex Percentile: Top 17%
Semiconductor Quantum Structures and Devices
1.25
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